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Thermal annealing effects on the morphology and charge transport of polymer semiconductor nanowires aligned in an insulating polymer matrix
Dyes and Pigments ( IF 4.5 ) Pub Date : 2020-10-27 , DOI: 10.1016/j.dyepig.2020.108962
Ganghoon Jeong , Solip Choi , Mingu Jang , Mincheol Chang

Thermal annealing can profoundly affect the molecular ordering, orientation, morphologies, and charge transport of poly(3-hexylthiophene) (P3HT) nanowires (NWs) aligned within a polystyrene (PS) matrix. Upon thermal annealing, the structural and morphological changes of the aligned P3HT-NWs were systematically studied using static absorption spectroscopy, X-ray diffraction, atomic force microscopy, and polarized optical microscopy; the change in charge transport properties was investigated using macroscale charge carrier mobility measurements. Further, the thermal annealing temperature and duration were thoroughly correlated with the molecular ordering, orientation, and charge transport properties of the aligned P3HT-NW/PS blend films. It was revealed that charge transport of the aligned blend films is determined by the complicated interplay between molecular ordering, orientation, and morphologies, which are prone to change by post-thermal annealing conditions. The orientation of the aligned blend films decreased with increasing annealing temperature, while the molecular ordering improved as the temperature increased up to 150 °C, and then decreased with further increasing temperature. Significant morphological changes of the aligned blend films were observed after thermal annealing at 200 °C, owing to the remarkable increase in the thermally induced diffusion of the polymer chains. Consequently, the highest charge transport was measured in the aligned P3HT-NW/PS blend films annealed at 100 °C for 10 min. However, the charge transport was decreased by increasing either the annealing temperature or duration.



中文翻译:

热退火对在绝缘聚合物基质中排列的聚合物半导体纳米线的形态和电荷传输的影响

热退火会深刻影响在聚苯乙烯(PS)基质中排列的聚(3-己基噻吩)(P3HT)纳米线(NW)的分子有序,取向,形态和电荷传输。热退火后,使用静态吸收光谱,X射线衍射,原子力显微镜和偏振光学显微镜系统地研究了对准的P3HT-NW的结构和形态变化。使用宏观电荷载流子迁移率测量研究了电荷传输性质的变化。此外,热退火温度和持续时间与取向的P3HT-NW / PS共混膜的分子有序,取向和电荷传输性质完全相关。揭示了取向共混膜的电荷传输是由分子有序,取向和形态之间的复杂相互作用决定的,分子相互作用,取向和形态之间的相互作用很容易被后热退火条件改变。取向共混膜的取向随退火温度的升高而降低,而分子序随温度升高至150°C而改善,然后随着温度的升高而降低。由于在热诱导下聚合物链的扩散显着增加,在200°C下进行热退火后,观察到取向共混膜的形态发生了显着变化。因此,在100°C退火10分钟的取向P3HT-NW / PS共混膜中测得的电荷传输最高。然而,

更新日期:2020-11-02
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