Abstract As increasingly smaller molecular materials and material structures are devised or developed for technological applications, the demands on the processes of lithography now routinely include feature sizes that are of the order of 10 nm. In reaching such a fine level of resolution, the methods of lithography have increased markedly in sophistication and brought into play 2terminology that is unfamiliar, on the one hand, to scientists tasked with the development of new lithographic materials or, on the other, to the engineers who design and operate the complex equipment that is required in modern-day processing. Publications produced by scientists need to be understood by engineers and vice versa, and these commonly arise from collaborative research that draws heavily on the terminology of two or more of the traditional disciplines. It is developments in polymer science and material science that lead progress in areas that cross traditional boundaries, such as microlithography. This document provides the exact definitions of a selection of unfamiliar terms that researchers and practitioners from different disciplines might encounter.

中文翻译：

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高级光刻中的聚合物术语（IUPAC 建议 2020）

摘要 随着越来越小的分子材料和材料结构被设计或开发用于技术应用，现在对光刻工艺的需求通常包括 10 nm 数量级的特征尺寸。在达到如此精细的分辨率水平时，光刻方法的复杂程度显着增加，并使用了 2 术语，一方面是负责开发新光刻材料的科学家，另一方面是设计和操作现代加工所需的复杂设备的工程师。科学家发表的论文需要工程师理解，反之亦然，而这些通常来自大量使用两个或多个传统学科术语的合作研究。正是聚合物科学和材料科学的发展引领了跨越传统界限的领域的进步，例如微光刻。本文档提供了来自不同学科的研究人员和从业人员可能会遇到的一系列不熟悉术语的确切定义。