Molybdenum disulfide (MoS2) is a significant material yet to be explored for its magnetic properties. In this letter, thin films of MoS2 are grown on n-silicon substrates via a spin coating method. Deposited films are magnetically annealed at 200 °C with a varying magnetic field from 280 to 520 G. Furthermore, the effect of magnetic field annealing on the structural and magnetization properties of the MoS2 films is analyzed via X-ray diffraction, field emission scanning electronic microscopy, energy dispersive X-ray spectroscopy, atomic force microscopy, and a vibrating sample magnetometer. It is observed that upon magnetic annealing of MoS2 film, a ferromagnetic character can be obtained with retentivity and coercivity of 3.56 × 10–3 emu/cm3 and 74.74 Oe, respectively.

中文翻译：

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磁场辅助退火铁磁二硫化钼薄膜

二硫化钼（MoS2）是一种重要的材料，其磁性尚待探索。在这封信中，MoS2 薄膜通过旋涂方法在 n 硅衬底上生长。沉积的薄膜在 200 °C 和 280 至 520 G 的变化磁场下进行磁性退火。此外，通过 X 射线衍射、场发射扫描电子分析磁场退火对 MoS2 薄膜的结构和磁化性能的影响显微镜、能量色散 X 射线光谱、原子力显微镜和振动样品磁强计。据观察，在对 MoS2 薄膜进行磁性退火后，可以获得铁磁特性，保持力和矫顽力分别为 3.56 × 10-3 emu/cm3 和 74.74 Oe。