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Mechanical anisotropy and electronic properties of X 2 N 2 (XH 2 ): first-principles calculations
Communications in Theoretical Physics ( IF 3.1 ) Pub Date : 2020-10-14 , DOI: 10.1088/1572-9494/aba25c
Xiao-Zhen Li 1 , Meng-Jiang Xing 2
Affiliation  

The mechanical anisotropy, structural properties, electronic band structures and thermal properties of C 2 N 2 (CH 2 ), Si 2 N 2 (SiH 2 ) and Ge 2 N 2 (GeH 2 ) are detailed and investigated in this work. The novel silicon nitride phase Si 2 N 2 (SiH 2 ) and germanium nitride phase Ge 2 N 2 (GeH 2 ) in the Cmc 2 1 structure are proposed in this work. The novel proposed Si 2 N 2 (SiH 2 ) and Ge 2 N 2 (GeH 2 ) are both mechanically and dynamically stable. The electronic band calculation of the HSE06 hybrid functional shows that C 2 N 2 (CH 2 ), Si 2 N 2 (SiH 2 ) and Ge 2 N 2 (GeH 2 ) are all wide band gap semiconductor materials, and C 2 N 2 (CH 2 ) and Si 2 N 2...

中文翻译:

X 2 N 2(XH 2)的机械各向异性和电子性质:第一性原理计算

本文详细研究了C 2 N 2(CH 2),Si 2 N 2(SiH 2)和Ge 2 N 2(GeH 2)的力学各向异性,结构性能,电子能带结构和热性能。在这项工作中,提出了新颖的Cmc 2 1结构的氮化硅相Si 2 N 2(SiH 2)和氮化锗相Ge 2 N 2(GeH 2)。提出的新颖的Si 2 N 2(SiH 2)和Ge 2 N 2(GeH 2)在机械和动态方面均稳定。HSE06混合功能的电子带计算表明,C 2 N 2(CH 2),Si 2 N 2(SiH 2)和Ge 2 N 2(GeH 2)均为宽带隙半导体材料,而C 2 N 2 (CH 2)和Si 2 N 2 ...
更新日期:2020-10-16
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