An X-ray diffraction investigation was carried out on nitrogen-containing 304 stainless steel thin films deposited by reactive rf magnetron sputtering over a range of substrate temperature and bias levels. The resulting films contained between ~28 and 32 at.% nitrogen. X-ray analysis was carried out using both the standard Bragg-Brentano method as well as area-detector diffractometry analysis. The extent of the diffraction anomaly ((002) peak shift) was determined using a calculated parameter, denoted R_B, which is based on the (111) and (002) peak positions. The normal value for R_B for FCC-based structures is 0.75 but increases as the (002) peak is anomalously displaced closer to the (111) peak. In this study, the R_B values for the deposited films were found to increase with substrate bias but decrease with substrate temperature (but still always >0.75). Using area detector diffractometry, we were able to measure d₁₁₁/d₀₀₂ values for similarly oriented grains within the films, and using these values calculate c/a ratios based on a tetragonal-structure model. These results allowed prediction of the (002)/(200) peak split for tetragonal structures. Despite predicting a reasonably accessible split (~0.6°–2.9°–2θ), no peak splitting observed, negating the tetragonal-structure hypothesis. Based on the effects of film bias/temperature on R_B values, a defect-based hypothesis is more viable as an explanation for the diffraction anomaly.

中文翻译：

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反应溅射沉积沉积的不锈钢-氮薄膜的X射线衍射研究

对通过反应性射频磁控溅射沉积的含氮304不锈钢薄膜进行了X射线衍射研究，其范围为衬底温度和偏压水平。所得的膜含有〜28至32原子％的氮。X射线分析是使用标准的Bragg-Brentano方法以及面积检测器衍射法进行的。使用表示为R _B的计算参数确定衍射异常的程度（（002）峰位移），该参数基于（111）和（002）峰位置。基于FCC的结构的R _B的正常值为0.75，但随着（002）峰异常地靠近（111）峰而增加。在这项研究中，R _B发现沉积膜的值随基底偏压而增加，但随基底温度而降低（但仍总是＞ 0.75）。使用面积检测器衍射法，我们能够测量薄膜中取向相似的晶粒的d ₁₁₁ / d ₀₀₂值，并使用这些值基于四边形结构模型计算c / a比。这些结果允许预测四方结构的（002）/（200）峰分裂。尽管预测会有合理的分裂（〜0.6°–2.9°–2θ），但未观察到峰分裂，否定了四方结构假说。基于薄膜偏压/温度对R _B值的影响，基于缺陷的假设更可行，可以解释衍射异常。