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Modeling, analysis, and code/data validation of DIII-D tokamak divertor experiments on ELM and non-ELM plasma tungsten sputtering erosion
Nuclear Fusion ( IF 3.3 ) Pub Date : 2020-10-14 , DOI: 10.1088/1741-4326/abb39c
J.N. Brooks 1 , T. Sizyuk 1 , J.D. Elder 2 , T. Abrams 3 , A. Hassanein 1 , D.L. Rudakov 4 , W. Wampler 5
Affiliation  

We analyzed recent DIII-D tokamak tungsten divertor probe experiments using advanced, coupled, sputter erosion/redeposition, plasma, and surface response code packages. Modeling is done for ELMing H-mode, and L-mode plasmas, impinging on various size tungsten deposits on Divertor Material Evaluation System (DiMES) carbon probes. The simulations compute 3D, full kinetic, sub-gyromotion, impurity sputtering and transport, including changes in tungsten surface composition and response due to mixed deuterium and carbon ions irradiation. Per our analysis, ELM (edge localized mode) plasma sputtering in DIII-D mostly involves free-streaming high energy (∼500–1000 eV) D+ and C+6 ions, with high near-surface plasma density. L-Mode sputtering is due to impurity sputtering (C, W) only, with lower density. All cases show complete redeposition of tungsten on the divertor, with significant redeposition on the tungsten spots themselves, and low self-sputtering. Comparison of ELM plasma gross tungsten erosion simulation results with in-situ spectroscopic data is good, as are code/data comparisons of net erosion using post-exposure Rutherford backscattering (RBS) data for the L-mode probes. The analysis, extrapolated to a full tungsten divertor, implies low net erosion and negligible plasma contamination from sputtering. These results support the use of high-Z plasma facing surfaces in ITER and beyond.



中文翻译:

DIII-D托卡马克偏滤器实验对ELM和非ELM等离子钨溅射腐蚀的建模,分析和代码/数据验证

我们使用先进的,耦合的,溅射腐蚀/再沉积,等离子体和表面响应代码包对最近的DIII-D托卡马克钨分流器探针实验进行了分析。对ELMing H型和L型等离子体进行了建模,撞击在Divertor材料评估系统(DiMES)碳探针上的各种尺寸的钨沉积物上。该模拟计算3D,全动力学,次回转,杂质溅射和传输,包括钨表面成分的变化以及由于氘和碳离子混合辐照引起的响应。根据我们的分析,DIII-D中的ELM(边缘局部模式)等离子体溅射主要涉及自由流高能(〜500–1000 eV)D +和C +6离子,具有较高的近表面等离子体密度。L型溅射仅由于杂质溅射(C,W)而导致,密度较低。所有情况都表明,钨在偏滤器上完全重新沉积,钨点本身上有明显的重新沉积,自溅射率低。ELM等离子体总钨腐蚀模拟结果与原位光谱数据的比较很好,使用L型探头的暴露后Rutherford背向散射(RBS)数据进行的净腐蚀的代码/数据比较也是如此。该分析外推至一个完整的钨分流器,意味着低净腐蚀和可忽略的溅射等离子体污染。这些结果支持在ITER及更高版本中使用面向高Z等离子体的表面。

更新日期:2020-10-14
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