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Atmospheric‐pressure plasma‐enhanced chemical vapor deposition of nanocomposite thin films from ethyl lactate and silica nanoparticles
Plasma Processes and Polymers ( IF 3.5 ) Pub Date : 2020-10-09 , DOI: 10.1002/ppap.202000153
Natalia Milaniak 1, 2, 3 , Gaétan Laroche 2, 3 , Françoise Massines 1
Affiliation  

Nanocomposite coatings are made by atmospheric‐pressure plasma‐enhanced chemical vapor deposition from ethyl lactate (EL) and silica nanoparticles (NPs) in a dielectric barrier discharge (DBD) using frequency‐shift keying (FSK) to alternate between 1‐ and 15‐kHz voltages. In situ plasma Fourier‐transform infrared spectroscopy (FTIR) and thin film FTIR, scanning electron microscopy, atomic force microscopy, and profilometry show that (i) 1 kHz DBD mainly deposits NPs, 15 kHz only polymerizes EL; (ii) the EL polymerization rate is the same in FSK and continuous modes; (iii) despite the 50/50 contribution of both frequencies, the NP deposit is three times faster in FSK mode than in 1 kHz DBD and compared with 1 and 15 kHz coatings, in the nanocomposite, NP Si–O–Si and EL C═O bonds per unit length are equal to 68% and 34%, respectively. In situ FTIR detects SiO2 NPs, their functionalization, and the formation of CO2.

中文翻译:

大气压等离子体增强化学气相沉积法制备乳酸乙酯和二氧化硅纳米粒子的纳米复合薄膜

纳米复合材料涂层是通过大气压等离子体增强化学气相沉积法从乳酸盐(EL)和二氧化硅纳米颗粒(NPs)在介电势垒放电(DBD)中使用频移键控(FSK)在1至15 kHz电压。原位等离子体傅里叶变换红外光谱(FTIR)和薄膜FTIR,扫描电子显微镜,原子力显微镜和轮廓分析表明:(i)1 kHz DBD主要沉积NP,15 kHz仅使EL聚合;(ii)在FSK和连续模式下,EL聚合速率相同;(iii)尽管两个频率均贡献了50/50,但在纳米复合材料NP Si–O–Si和EL C中,NPK沉积在FSK模式下比1 kHz DBD快三倍,并且与1和15 kHz涂层相比每单位长度的O键分别等于68%和34%。2个NP,它们的功能化和CO 2的形成。
更新日期:2020-10-09
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