Reduced graphene oxide (RGO) or graphene as it is commonly referred to is currently the most promising nanomaterial with potential applications. Synthesis of RGO starts with oxidation of graphite to graphene oxide (GO) which is further reduced either by chemical or thermal means. However, chemical reduction of GO to RGO involves the use of toxic chemical reagents which are not environmental friendly. Hence, in this work, low-temperature thermal reduction has been utilized to obtain high-quality RGO from GO effectively at a temperature of only 50 °C. The precursor of RGO which is GO is synthesized by modification of Improved Hummer’s method (Marcano et al. in ACS Nano 4(8):4806–4814, 2010), a non-toxic and non-explosive method of GO production. The highly exothermic reactions in producing GO are controlled by using ice baths with magnetic stirring. The prepared samples were characterized by X-ray diffraction (XRD), Fourier-transform infrared spectroscopy (FTIR), Raman spectroscopy, Scanning electron microscopy and Energy-dispersive X-ray spectroscopy. All four characterizations confirm the efficient oxidation and reduction that has taken place to produce GO and RGO-4. (RGO formed on the 7th day of the reduction process.) XRD peak of GO at 10.46° corresponding to (001) plane indicating an interplanar spacing of 0.80 nm confirms the proper oxidation of graphite to GO. However, after thermal reduction at 50 °C the 2θ peak of GO at 10.46° shifts to 2θ = 24.15° with an interplanar spacing of 0.36 nm that confirms the formation of RGO-4 with retention of most of the sp² structures by proper reduction of the oxygenated functional groups of GO. The GO produced is hydrophilic in nature due to existence of large number of oxygen-containing functional groups as shown in FTIR analysis. Raman results show that after reduction of GO to RGO-4 at 50 °C, the I_D/I_G ratio decreased significantly from 1.93 of GO to 1.00 of RGO-4 indicating highly reduced defects density in RGO-4.

还原石墨烯（RGO）或石墨烯，通常被称为是目前最有希望的具有潜在应用的纳米材料。RGO的合成始于将石墨氧化为氧化石墨烯（GO），然后通过化学或热方法进一步还原。但是，GO还原为RGO涉及使用对环境不利的有毒化学试剂。因此，在这项工作中，已经利用低温热还原在仅50°C的温度下有效地从GO中获得高质量的RGO。RGO的前体是GO，它是通过改良Hummer方法（Marcano等人在ACS Nano 4（8）：4806-4814，2010）中进行改进而合成的，GO是一种无毒，不爆炸的GO生产方法。通过在磁力搅拌下使用冰浴来控制生产GO中的高放热反应。通过X射线衍射（XRD），傅立叶变换红外光谱（FTIR），拉曼光谱，扫描电子显微镜和能量色散X射线光谱对制备的样品进行表征。所有这四个特征证实了生产GO和RGO-4的有效氧化和还原。（RGO在还原过程的第7天形成。）GO在10.46°处的XRD峰对应于（001）平面，表明晶面间距为0.80 nm，证实了石墨已适当氧化为GO。但是，在50°C下热还原后，2 所有这四个特征证实了生产GO和RGO-4的有效氧化和还原。（RGO在还原过程的第7天形成。）GO在10.46°处的XRD峰对应于（001）平面，指示晶面间距为0.80 nm，证实了石墨已适当氧化为GO。但是，在50°C下热还原后，2 所有这四个特征证实了生产GO和RGO-4的有效氧化和还原。（RGO在还原过程的第7天形成。）GO在10.46°处的XRD峰对应于（001）平面，指示晶面间距为0.80 nm，证实了石墨已适当氧化为GO。但是，在50°C下热还原后，2θ在10.46°转移到2 GO的峰θ  = 24.15°，0.36 nm的面间距，确认与大部分的保留形成RGO-4的SP ^2层由GO的含氧官能团的适当的还原结构。FTIR分析显示，由于存在大量的含氧官能团，因此生成的GO本质上是亲水的。拉曼结果显示，在50°C下GO还原为RGO-4后，I _D / I _G比从GO的1.93显着降低到RGO-4的1.00，表明RGO-4中的缺陷密度大大降低。