Spray pyrolysis technique was applied to deposit two sets of ultra‐thin layers of tin dioxide (SnO₂). For the first and second sets, 0.01 and 0.05 molar precursor solutions were prepared, respectively. In both sets, utilizing the X‐ray reflectivity (XRR) technique, the effect of precursor concentration (PC) and precursor volume (PV) on the layer structure are investigated. The layer thickness of the samples, in each set, is a PV‐dependent parameter. For the same PV, samples with higher PC have a larger thickness and higher density. The electron density profiles deduced from XRR data analyses establish a link between measured values of sheet resistance and electron densities. The samples with higher PV and PC show less sheet resistance. The quantum size effect was utilized to show that the surface roughness for layers of more than almost 200 Å of samples in set two plays no role in the layer conductivity. Meanwhile, the same effect explains, adequately, the role of the surface roughness in the resistivity of the ultra‐thin layers in Set 1.

中文翻译：

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X射线反射率研究SnO2超薄层的表面粗糙度和电导率

喷雾热解技术用于沉积两组超薄二氧化锡（SnO ₂）。对于第一组和第二组，分别制备了0.01和0.05摩尔的前体溶液。在两组中，利用X射线反射率（XRR）技术，研究了前驱体浓度（PC）和前驱体体积（PV）对层结构的影响。在每组中，样品的层厚是取决于PV的参数。对于相同的PV，具有较高PC的样品具有较大的厚度和较高的密度。从XRR数据分析得出的电子密度分布在薄层电阻的测量值和电子密度之间建立了联系。PV和PC较高的样品的薄层电阻较小。利用量子尺寸效应表明，在第二组中，几乎200埃以上样品的层表面粗糙度对层电导率没有影响。同时，相同的效果说明