Abstract Zn thin films are deposited on quartz substrate by DC magnetron sputtering method under the same condition. Then, ZnO nanoparticles are produced by heating Zn thin films in the open air at temperatures of 300, 500, 700, 900, and 1100°C for 2 hours. XRD analysis of these films shows that except for the 1100-ZnO sample, which has a cubic structure, the rest of the films confirm the hexagonal crystal structure of the Wurtzite. An examination of the ultraviolet spectrum and the calculation of optical parameters also indicate that annealing temperature is an influential factor on optical properties of high-quality ZnO thin films. Also, changes in optical energy bandgap of the samples correspond to the Burstein-Moss theory. Examination of the spectrum of photosynthesis through severe exciton emission demonstrates a minor defect in ZnO nanoparticles prepared this way. In general, findings indicate that physical properties of ZnO thin films are affected by annealing temperature, and among the samples, 700-ZnO sample displays the optimum optical and structural properties.

中文翻译：

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作为退火温度函数的高性能纳米结构氧化锌薄膜的形成：结构和光学特性

摘要 在相同条件下，采用直流磁控溅射法在石英衬底上沉积Zn薄膜。然后，通过在露天在 300、500、700、900 和 1100°C 的温度下加热 Zn 薄膜 2 小时来生产 ZnO 纳米颗粒。这些薄膜的 XRD 分析表明，除了具有立方结构的 1100-ZnO 样品外，其余薄膜证实了纤锌矿的六方晶体结构。紫外光谱的检查和光学参数的计算也表明，退火温度是影响高质量 ZnO 薄膜光学性能的一个影响因素。此外，样品的光能带隙变化符合 Burstein-Moss 理论。通过严重激子发射对光合作用光谱的检查表明，以这种方式制备的 ZnO 纳米颗粒存在轻微缺陷。总的来说，研究结果表明 ZnO 薄膜的物理性能受退火温度的影响，在样品中，700-ZnO 样品显示出最佳的光学和结构性能。