Abstract Nickel titanate (NiTiO3) is well known for its interesting functional properties such as photocatalysis, high-K materials or magnetoelectric coupling. Some of these properties are strongly dependent on crystallographic orientation and morphological characteristics. Deposition as thin films through adapted processes enables to control such feature during NiTiO3 growth. In this context, NiTiO3 thin films were obtained by a two-step process: i) room temperature radio-Frequency co-sputtering of metallic Ni and Ti targets, ii) ex situ annealing in air. Influences of the deposition and annealing parameters on the morphological and structural features of NiTiO3 thin films were systematically studied. First, in situ X-ray diffraction as a function of temperature (from 30°C to 1200°C) was carried out in air on a NiTi thin film to identify suitable annealing temperatures for NiTiO3 oxide formation. Then, effects of annealing duration and temperature on morphology and orientation were investigated. Annealing temperature was found to influence grain size, while increasing the annealing time was found to bring (006) crystallographic orientation. Finally, an increase of the deposition pressure from 0.5 Pa to 5 Pa promoted the growth of (104) oriented films with a Lotgering factor LF104=0.44. This approach enables to independently tune preferential orientation and grain size of NiTiO3 thin films, by tailored deposition and annealing conditions.

中文翻译：

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溅射条件和退火参数对NiTiO3钛铁矿薄膜结构和形貌的影响

摘要 钛酸镍 (NiTiO3) 以其有趣的功能特性而闻名，例如光催化、高 K 材料或磁电耦合。其中一些性质强烈依赖于晶体取向和形态特征。通过合适的工艺沉积为薄膜能够在 NiTiO3 生长过程中控制这种特征。在这种情况下，NiTiO3 薄膜是通过两步工艺获得的：i) 金属 Ni 和 Ti 靶的室温射频共溅射，ii) 在空气中的非原位退火。系统研究了沉积和退火参数对NiTiO3薄膜形态和结构特征的影响。第一的，在空气中对 NiTi 薄膜进行原位 X 射线衍射作为温度的函数（从 30°C 到 1200°C），以确定适合 NiTiO3 氧化物形成的退火温度。然后，研究了退火时间和温度对形貌和取向的影响。发现退火温度会影响晶粒尺寸，同时发现增加退火时间会带来（006）晶体取向。最后，沉积压力从 0.5 Pa 增加到 5 Pa 促进了 (104) 取向薄膜的生长，Lotgering 因子 LF104 = 0.44。这种方法能够通过定制的沉积和退火条件独立调整 NiTiO3 薄膜的优先取向和晶粒尺寸。研究了退火时间和温度对形貌和取向的影响。发现退火温度会影响晶粒尺寸，同时发现增加退火时间会带来（006）晶体取向。最后，沉积压力从 0.5 Pa 增加到 5 Pa 促进了（104）取向薄膜的生长，Lotgering 因子 LF104=0.44。这种方法能够通过定制的沉积和退火条件独立调整 NiTiO3 薄膜的优先取向和晶粒尺寸。研究了退火时间和温度对形貌和取向的影响。发现退火温度会影响晶粒尺寸，同时发现增加退火时间会带来（006）晶体取向。最后，沉积压力从 0.5 Pa 增加到 5 Pa 促进了（104）取向薄膜的生长，Lotgering 因子 LF104=0.44。这种方法能够通过定制的沉积和退火条件独立调整 NiTiO3 薄膜的优先取向和晶粒尺寸。5Pa～5Pa促进(104)取向膜的生长，Lotgering因子LF104=0.44。这种方法能够通过定制的沉积和退火条件独立调整 NiTiO3 薄膜的优先取向和晶粒尺寸。5Pa～5Pa促进(104)取向膜的生长，Lotgering因子LF104=0.44。这种方法能够通过定制的沉积和退火条件独立调整 NiTiO3 薄膜的优先取向和晶粒尺寸。