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Site‐selective atmospheric pressure plasma‐enhanced chemical vapor deposition process for micrometric deposition of plasma‐polymerized methyl methacrylate
Plasma Processes and Polymers ( IF 3.5 ) Pub Date : 2020-09-30 , DOI: 10.1002/ppap.202000143
Kishor Acharya 1 , Simon Bulou 1 , Thomas Gaulain 1 , Mathieu Gérard 1 , Patrick Choquet 1
Affiliation  

An atmospheric pressure plasma chemical vapor deposition process designed for the site‐selective deposition of organic functional materials with a sub‐millimetric lateral resolution is presented in this study. Injecting methyl methacrylate vapor in plasma post‐discharge allowed to synthesize plasma‐polymerized methyl methacrylate (ppMMA) coatings on metallic, dielectric, and polymer substrates at close to room temperature (40°C). A circular dot, as small as 400 µm in diameter, of ppMMA is deposited and characterized by Fourier‐transform infrared spectroscopy, X‐ray photoelectron spectroscopy, and high‐resolution mass spectrometry. Oligomeric species of poly‐MMA up to n = 18 have been detected, evidencing the particularly “soft” polymerization offered by the presented process.

中文翻译:

现场选择大气压等离子体增强化学气相沉积工艺,用于等离子体聚合的甲基丙烯酸甲酯的微米级沉积

在这项研究中,提出了一种大气压等离子体化学气相沉积工艺,该工艺设计用于局部选择性沉积具有亚毫微米横向分辨率的有机功能材料。在等离子后放电中注入甲基丙烯酸甲酯蒸汽可以在接近室温(40°C)的情况下在金属,电介质和聚合物基材上合成等离子聚合的甲基丙烯酸甲酯(ppMMA)涂层。沉积直径为400 µm的ppMMA圆点,并通过傅里叶变换红外光谱,X射线光电子能谱和高分辨率质谱进行表征。 已检测到n = 18以下的聚MMA低聚物,证明了所提出方法提供的特别“软”聚合。
更新日期:2020-09-30
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