Abstract In interference lithography, 1-dimensional (1D) Fourier series expansion (FSE) technique can be used to create 1D periodic arbitrary patterns. Since the energy of electric field can change the solubility of photoresist, the required electric field intensity to create the desired pattern should be found. Therefore, in this article, an inequality for the magnitude of electric field on the surface of photoresist is addressed. A solution to this equation is provided with one degree of freedom. Intelligent selection of the parameters corresponding to this degree of freedom enhances the performance of the system seriously. The proposed method confirms that our approach can produce subwavelength resolutions. Based on these achievements, we present a new lithography system that can generate 1D periodic arbitrary patterns.

中文翻译：

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一种基于傅立叶级数的一维周期性任意光刻方法

摘要 在干涉光刻中，一维 (1D) 傅里叶级数展开 (FSE) 技术可用于创建一维周期性任意图案。由于电场能量可以改变光刻胶的溶解度，因此应该找到创建所需图案所需的电场强度。因此，在本文中，解决了光刻胶表面电场强度的不等式。该方程的解具有一个自由度。智能选择与该自由度相对应的参数极大地提高了系统的性能。所提出的方法证实了我们的方法可以产生亚波长分辨率。基于这些成就，我们提出了一种新的光刻系统，可以生成一维周期性任意图案。