Abstract Vanadium Dioxide (VO2) is a strongly correlated material, which exhibits insulator to metal transition at ~68 °C along with large resistivity and infrared optical reflectance modulation. In this work, we use atmospheric pressure thermal oxidation of Vanadium to synthesize VO2 films on glass and ITO coated glass substrates. With the optimized short oxidation durations of 2 min and 4 min, the synthesized VO2 film shows high optical reflectance switching in long-wavelength infrared (8–14 μm) on glass substrates and mid-wavelength infrared (3–5 μm) on ITO coated glass substrates, respectively. Peak reflectance switching values of ~76% (at 9 μm) and ~79% (at 4.6 μm) are obtained on the respective substrates, which are among the highest reported values. Using the reflectance data, we extract VO2 complex refractive index in infrared wavelengths, in both the insulating and metallic phases. The extracted refractive index shows good agreement with VO2 synthesized using other methods. This demonstration of high optical reflectance switching in VO2 thin films, grown on low cost glass and ITO coated glass substrates, using a simple low thermal budget process will aid in enhancing VO2 applications in the optical domain.

中文翻译：

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使用钒的大气氧化在玻璃和 ITO 涂层玻璃基板上合成的 VO2 薄膜中的高红外反射调制

摘要 二氧化钒 (VO2) 是一种强相关材料，在~68 °C 时表现出绝缘体到金属的转变以及大电阻率和红外光反射调制。在这项工作中，我们使用钒的常压热氧化在玻璃和 ITO 涂层玻璃基板上合成 VO2 薄膜。优化的短氧化持续时间为 2 分钟和 4 分钟，合成的 VO2 薄膜在玻璃基板上的长波长红外 (8-14 μm) 和 ITO 涂层上的中波长红外 (3-5 μm) 中显示出高光学反射切换玻璃基板，分别。在各自的基板上获得了~76%（在 9 μm）和~79%（在 4.6 μm）的峰值反射切换值，这是最高的报告值。使用反射率数据，我们提取红外波长中的 VO2 复折射率，在绝缘相和金属相中。提取的折射率与使用其他方法合成的 VO2 显示出良好的一致性。使用简单的低热预算工艺在低成本玻璃和 ITO 涂层玻璃基板上生长的 VO2 薄膜中的高光学反射率转换演示将有助于增强 VO2 在光学领域的应用。