Mesoporous thin films (MTFs) displaying high surface area and controlled porosity constitute interesting materials for a plethora of applications in optics and electronics. A critical aspect in MTF processing is template removal that usually consists in thermal treatment at 350 °C, which consolidates the oxide film but might change the pore features. In addition, the use of such high temperature must be avoided when organic functionalities are to be preserved, or in the case of film deposition on polymeric substrates. Here we present and compare five different methods to consolidate silica MTF (SMTF) in mild conditions, at a maximum processing temperature of 130 °C. Conditions, such as duration of the thermal treatment, vacuum conditions, exposure to acidic and alkaline media, were systematically explored and the resulting films were analyzed by optical microscopy, focused ion beam, scanning electron microscopy, ellipsometry, and infrared spectroscopy. The optimized conditions leading to accessible mesopores and a stable oxide structure that can be used as a mesoporous perm-selective electrode are discussed.

显示高表面积和受控孔隙率的中孔薄膜（MTF）构成了在光学和电子学中大量应用的有趣材料。MTF处理中的一个关键方面是模板去除，通常是在350°C的温度下进行热处理，这可以固结氧化膜，但可能会改变孔的特征。另外，当要保留有机功能性时，或在聚合物基材上成膜的情况下，必须避免使用这种高温。在这里，我们介绍并比较五种不同的方法，以在温和条件下，最高加工温度为130°C的条件下固结二氧化硅MTF（SMTF）。条件，例如热处理时间，真空条件，暴露于酸性和碱性介质，进行了系统地探索，并通过光学显微镜，聚焦离子束，扫描电子显微镜，椭圆光度法和红外光谱对所得膜进行了分析。讨论了导致可访问的中孔和稳定的氧化物结构（可用作中孔渗透选择电极）的最佳条件。