The dielectric breakdown used to fabricate solid-state nanopores has separated the device from capital-intensive industries and has been widely adopted by various research teams, but there are still problems with low production efficiency and uncertain location. In this work, based on the transient breakdown phenomenon of nanofilms, a new type of dielectric breakdown apparatus for nanopore fabrication is reported. It integrates both nano-manipulation technology and dielectric breakdown nanopore fabrication technology. The nanometer distance detection method and circuit are introduced in detail. The generation principle and procedures of the transient high electric field are explained step by step. The characterization of the nanopores shows that this apparatus can fabricate sub-2 nm nanopores at a pre-located position. Besides, the nanopore diameter can be easily adjusted by setting the transient high electric field value.

中文翻译：

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一种用于瞬态高电场固态纳米孔制造的新型介电击穿装置

用于制造固态纳米孔的介电击穿使该器件脱离了资本密集型产业，并被各个研究团队广泛采用，但仍存在生产效率低和位置不确定的问题。在这项工作中，基于纳米膜的瞬态击穿现象，报道了一种用于纳米孔制造的新型介电击穿装置。它集成了纳米操作技术和介电击穿纳米孔制造技术。详细介绍了纳米距离检测方法和电路。分步解释了瞬态高电场的产生原理和过程。纳米孔的表征表明该装置可以在预先定位的位置制造亚 2 nm 纳米孔。除了，