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Characterization of edge dislocation density through X-ray diffraction rocking curves
Journal of Crystal Growth ( IF 1.8 ) Pub Date : 2020-12-01 , DOI: 10.1016/j.jcrysgro.2020.125893
Yangfeng Li , Shen Yan , Xiaotao Hu , Yimeng Song , Zhen Deng , Chunhua Du , Wenqi Wang , Ziguang Ma , Lu Wang , Haiqiang Jia , Wenxin Wang , Junming Zhou , Yang Jiang , Hong Chen

Abstract A detailed geometric model for calculating the edge dislocation density through X-ray diffraction rocking curves is proposed in this study. Based on this model, we deduce a new formula to evaluate the edge dislocation density from the full-width at half-maximum values of skew symmetric rocking curves. The widely used formula proposed by Srikant et al. is an approximate result of this formula. The fitting results obtained by the two formulae coincide well from the measurement data of gallium nitride films grown on silicon substrate.

中文翻译:

通过 X 射线衍射摇摆曲线表征刃位错密度

摘要 本研究提出了一种通过X射线衍射摇摆曲线计算刃位错密度的详细几何模型。在此模型的基础上,我们推导出了一个新的公式,用于从偏斜对称摇摆曲线的半最大值处的全宽来评估边缘位错密度。Srikant 等人提出的广泛使用的公式。是这个公式的近似结果。两个公式得到的拟合结果与硅衬底上生长的氮化镓薄膜的测量数据吻合良好。
更新日期:2020-12-01
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