Expanding the industry and technology of semiconductors requires developing the multifunctionality and performance of p-type transparent conducting oxides (TCO). This work is an attempt to tune the physical properties of nickel oxide (NiO) by using the codoping approach. Pb-doped and (Ir, Pb) codoped films have been deposited by sol-gel combined with spin coating technique. XRD, EDS, and AFM were used to investigate the crystal structure, chemical composition, size, particles' shape, and surface morphology. All films exhibited a polycrystalline structure and a cubic phase. The crystallite size and surface roughness significantly affected by type and dopant content. A maximum root mean square roughness (R_q) with a distinctive island formed layer was obtained at 1.0% Ir + 2.0% Pb doping level. UV–vis-IR measurements showed that the optical parameters; absorption index, optical band gap, refractive index, dielectric constant, and optical conductivity are sensitive to Pb and Ir doping ratios. IV measurements showed good Ohmic behavior and sheet resistance of 13 × 10⁴ Ω/sq. for pure NiO was decreased to be ˂ 6 × 10⁴ Ω/sq., at 2.0% Pb doping. Moreover, the figure of merit exhibited the highest value of 1.35 × 10⁻⁷ Ω⁻¹ for NiO: (1.0% Ir + 2.0% Pb) which enables the use of these films as a window layer in smart windows and solar cells and for other optoelectronic applications.

扩大半导体产业和技术需要开发p型透明导电氧化物（TCO）的多功能性和性能。这项工作是尝试通过使用共掺杂方法来调整氧化镍（NiO）的物理性能。已通过溶胶-凝胶结合旋涂技术沉积了掺Pb和（Ir，Pb）共掺杂的薄膜。XRD，EDS和AFM用于研究晶体结构，化学成分，尺寸，颗粒形状和表面形态。所有膜均表现出多晶结构和立方相。晶粒尺寸和表面粗糙度受类型和掺杂剂含量的显着影响。最大均方根粗糙度（[R _q为1.0，获得）以鲜明的岛形成的层％Ir + 2.0 ％ Pb掺杂水平。紫外-可见-红外测量表明其光学参数；吸收指数，光学带隙，折射率，介电常数和光导率对Pb和Ir掺杂比敏感。IV测量显示13×10的良好欧姆特性和薄膜电阻⁴  Ω/□。对于纯的NiO被降低到˂6×10 ⁴  Ω/□。，在2.0 ％的Pb掺杂。此外，品质因数显示出最高值1.35×10 ^-7  Ω ^-1为的NiO：（1.0 ％的Ir + 2.0 ％的Pb），其使得能够使用这些膜的如在智能窗和太阳能电池和用于窗口层其他光电应用。