Abstract A polyorganosiloxane thin film was deposited on an optically transparent poly(ethylene 2,6-naphthalate) (PEN) film using plasma-enhanced chemical vapor deposition (PECVD) at room temperature to improve the moisture barrier property of the PEN film. In the PECVD process, hexamethyldisiloxane (HMDSO) was used as the monomer. Argon or oxygen and their mixture gases were used as the plasma carrier gas. Poly(HMDSO) thin film was successfully deposited through plasma-induced radical polymerization reaction on the surface of PEN film. It was observed that the mixture ratio of argon-oxygen carrier gas significantly affected the surface and the moisture barrier properties of the resulting poly(HMDSO) film. Chemical structures of the poly(HMDSO) were confirmed using FT-IR analysis. Surface properties of the poly(HMDSO) thin film were investigated by water contact angle measurement and atomic force microscopy (AFM). Water vapor transmission rate (WVTR) value was obtained by an electrical calcium test (Ca test) at 85 °C and 85% relative humidity condition. It was confirmed that the poly(HMDSO) thin film exhibited excellent water vapor barrier capability. WVTR value of the PEN film coated with poly(HMDSO) deposited with a mixture of argon and oxygen (Ar: O2 = 2: 8) was 5.09 g/m2-day, which is much lower than 18.4 g/m2-day of a bare PEN film.

中文翻译：

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等离子体载气对等离子体增强化学气相沉积 (PECVD) 聚有机硅氧烷薄膜水分阻隔性能的影响

摘要 使用等离子体增强化学气相沉积 (PECVD) 在室温下在光学透明的聚 (2,6-萘二甲酸乙二醇酯) (PEN) 薄膜上沉积聚有机硅氧烷薄膜，以提高 PEN 薄膜的防潮性能。在 PECVD 工艺中，使用六甲基二硅氧烷 (HMDSO) 作为单体。氩气或氧气及其混合气体用作等离子体载气。通过等离子体诱导自由基聚合反应在 PEN 薄膜表面成功沉积了聚 (HMDSO) 薄膜。观察到氩氧载气的混合比显着影响所得聚（HMDSO）薄膜的表面和防潮性能。使用 FT-IR 分析确认了聚 (HMDSO) 的化学结构。通过水接触角测量和原子力显微镜 (AFM) 研究了聚 (HMDSO) 薄膜的表面特性。水蒸气透过率 (WVTR) 值是在 85°C 和 85% 相对湿度条件下通过电钙测试（Ca 测试）获得的。证实聚（HMDSO）薄膜表现出优异的水蒸气阻隔能力。涂有聚 (HMDSO) 的 PEN 薄膜的 WVTR 值为 5.09 g/m2-day，远低于 18.4 g/m2-day裸PEN胶卷。证实聚（HMDSO）薄膜表现出优异的水蒸气阻隔能力。涂有聚 (HMDSO) 的 PEN 薄膜的 WVTR 值为 5.09 g/m2-day，远低于 18.4 g/m2-day裸 PEN 胶片。证实聚（HMDSO）薄膜表现出优异的水蒸气阻隔能力。涂有聚 (HMDSO) 的 PEN 薄膜的 WVTR 值为 5.09 g/m2-day，远低于 18.4 g/m2-day裸PEN胶卷。