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Effect of surface potential distribution on corrosion behavior of Cu/Al interface in Cu wire bonding applications
Microelectronics Reliability ( IF 1.6 ) Pub Date : 2020-10-01 , DOI: 10.1016/j.microrel.2020.113942
Omid Mokhtari , Hiroshi Nishikawa

Abstract As Cu is appearing to be a promising alternative for Au in wire bonding applications the corrosion behavior of the Cu/Al intermetallic compounds (IMCs) is becoming a concern. In this study, the corrosion behavior of Cu/Al IMC layers in NaCl solution is investigated. Among Cu9Al4, CuAl and CuAl2 IMCs only CuAl IMC appears to be corroded. The surface potential difference between Cu, Al, and Cu/Al IMCs are measured using scanning Kelvin probe force microscopy and the largest surface potential difference appears to be between Cu9Al4 and CuAl suggesting the formation of a galvanic cell at the interface between Cu9Al4 and CuAl causing CuAl to act as the anode.

中文翻译:

表面电位分布对铜线键合应用中铜/铝界面腐蚀行为的影响

摘要 由于在引线键合应用中,Cu 似乎是 Au 的一种有前途的替代品,因此 Cu/Al 金属间化合物 (IMC) 的腐蚀行为正成为一个问题。在本研究中,研究了 Cu/Al IMC 层在 NaCl 溶液中的腐蚀行为。在 Cu9Al4、CuAl 和 CuAl2 IMC 中,只有 CuAl IMC 被腐蚀。使用扫描开尔文探针力显微镜测量 Cu、Al 和 Cu/Al IMC 之间的表面电位差,最大的表面电位差出现在 Cu9Al4 和 CuAl 之间,表明在 Cu9Al4 和 CuAl 之间的界面处形成原电池,导致CuAl 作为阳极。
更新日期:2020-10-01
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