Abstract Understanding the interaction between the structure and the tribological properties of sputtered molybdenum disulfide films at elevated temperatures is essential for their use in industrial applications. Therefore, the friction and wear behavior up to of 400 °C of one stoichiometric MoS 2 and a sub-stoichiometric MoS1.6 film are investigated against 100Cr6 counterparts. With an increasing temperature up to 200 °C, the friction decreases, which is attributed to a thermally activated water desorption and an increasing intensity of the (002) basal plane. Due to a passivation mechanism caused by the sulfur defect sites, the friction is lower for the sub-stoichiometric film. Above this temperature the friction increases for both films and failure occurs at 400 °C. Therefore, the friction at elevated temperatures result from a complex interaction of re-orientation mechanisms, desorption and oxidation processes.

中文翻译：

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HiPIMS合成的MoSx薄膜的温度依赖性摩擦学行为

摘要 了解溅射二硫化钼薄膜在高温下的结构和摩擦学特性之间的相互作用对于它们在工业应用中的应用至关重要。因此，针对 100Cr6 对应物研究了一种化学计量的 MoS 2 和亚化学计量的 MoS1.6 薄膜在高达 400 °C 时的摩擦和磨损行为。随着温度升高至 200 °C，摩擦力减小，这归因于热活化水解吸和 (002) 基面强度的增加。由于硫缺陷位点引起的钝化机制，亚化学计量膜的摩擦较低。高于此温度，两种薄膜的摩擦都会增加，并且在 400 °C 时会发生故障。所以，