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Chemical vapour deposition of graphene: layer control, the transfer process, characterisation, and related applications
International Reviews in Physical Chemistry ( IF 6.1 ) Pub Date : 2019-04-03 , DOI: 10.1080/0144235x.2019.1634319
Xiaohua Yang 1 , Gaixia Zhang 1 , Jai Prakash 1, 2 , Zhangsen Chen 1 , Marc Gauthier 1 , Shuhui Sun 1
Affiliation  

ABSTRACT Graphene, one of the most promising two-dimensional (2D) nanomaterials, has gained substantial attention in several areas of materials science. Due to its unique mechanical, electrical, optical, and thermal properties, graphene-based materials have triggered both numerous fundamental studies and technological applications. Out of several synthetic methods, chemical vapour deposition (CVD) has emerged as one of the most promising methods for the production of large areas of high quality single-crystal graphene. This review introduces the fundamental growth mechanisms of CVD graphene, alongside the various parameters and substrates employed in this process. Furthermore, new developments in the CVD synthesis of monolayer and few-layer graphene are presented, as well as advanced techniques for analysing the fine structure and properties of graphene. Moreover, a detailed discussion of the transfer processes used for practical applications of CVD graphene is provided, with emphasis on their fundamental aspects. This review concludes with an outlook on presently challenging issues, prospects and applications of graphene.

中文翻译:

石墨烯的化学气相沉积:层控制、转移过程、表征和相关应用

摘要 石墨烯是最有前途的二维 (2D) 纳米材料之一,在材料科学的多个领域得到了广泛关注。由于其独特的机械、电学、光学和热学特性,石墨烯基材料引发了众多基础研究和技术应用。在几种合成方法中,化学气相沉积 (CVD) 已成为生产大面积高质量单晶石墨烯的最有前途的方法之一。本综述介绍了 CVD 石墨烯的基本生长机制,以及该过程中使用的各种参数和基材。此外,还介绍了单层和少层石墨烯 CVD 合成的新进展,以及分析石墨烯精细结构和性能的先进技术。此外,还详细讨论了用于 CVD 石墨烯实际应用的转移过程,重点是它们的基本方面。本综述最后对石墨烯目前具有挑战性的问题、前景和应用进行了展望。
更新日期:2019-04-03
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