Silicon micropillar structure was fabricated by a one-step masking/metal-assisted chemical etching (MACE) composite method. This method integrates the traditional metal-assisted chemical etching process and the K₂SiF₆ particle masking process. Utilizing the integrated method, a vertical and uniform micropillar structure has been successfully obtained. The morphology evolution of the single silicon micropillar structure was investigated, including the effect of etching time and concentration of etchant solution. Meanwhile, the fabrication mechanism, which is based on the metal-assisted chemical etching process and K₂SiF₆ masking process, has been explored. This facile and widely applicable synthesis method for silicon micropillar structures provides the route to the application of silicon micropillar photoelectric devices, and the gap of the structures can provide the release space for device bending, which is suitable for the flexible solar cells.

中文翻译：

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一步掩膜/ MACE复合方法无模板制造硅微柱结构

硅微柱结构是通过一步掩膜/金属辅助化学蚀刻（MACE）复合方法制造的。该方法结合了传统的金属辅助化学蚀刻工艺和K ₂ SiF ₆颗粒掩膜工艺。利用集成方法，已经成功地获得了垂直且均匀的微柱结构。研究了单硅微柱结构的形貌演变，包括刻蚀时间和刻蚀液浓度的影响。同时，基于金属辅助化学蚀刻工艺和K ₂ SiF ₆的制造机理掩膜工艺，已经被探索。这种简便且广泛适用的硅微柱结构合成方法为硅微柱光电器件的应用提供了途径，并且结构的间隙可以为器件弯曲提供释放空间，适用于柔性太阳能电池。