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Surface characterization and electrochemical properties of tantalum nitride (TaN) nanostructured coatings produced by reactive DC magnetron sputtering
Surfaces and Interfaces ( IF 6.2 ) Pub Date : 2020-12-01 , DOI: 10.1016/j.surfin.2020.100685
Kazem Babaei , Arash Fattah-alhosseini , Hassan Elmkhah , Hamidreza Ghomi

Abstract In this study, TaN nanostructured coatings were successfully produced on AISI 316 L stainless steel substrates using the reactive DC magnetron sputtering method. Among all of these coating processes, the only variable factor was the percentage of partial pressure of nitrogen gas (PN2) which was attended in the sputtering process. To do this, the percentage of partial pressure of nitrogen gas was chosen in different percentages of 5%, 10% and 15%. After the coatings formation, their microstructure, chemical composition and corrosion behavior were studied. The microstructure of the samples coated was studied by the scanning electron microscope (SEM), their elemental and phase composition by energy diffraction spectroscopy (EDS), X-ray diffraction (XRD) and elemental distribution was carried out by mapping (MAP) analysis. In order to study the corrosion behavior of coatings, the electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization (PDP) tests were carried out in a simulated body fluid (Ringer's solution). Immersion time of specimens was determined 1, 24, 48 h and 7 days in Ringer's solution. The results of different tests showed that coatings containing 15% nitrogen consisted of hard orthorhombic and hexagonal tantalum nitride phases, had free pores and denser microstructure. This coating exhibited better corrosion behavior than the other two ones in all of the immersion times. The corrosion resistance of this coating also increased by rising immersion time from 1 h to 7 days. In fact, the coating containing 15% of nitrogen being immersed for 7 days with a resistance of 118.68 (MΩ.cm2), had the highest corrosion resistance.

中文翻译:

反应性直流磁控溅射制备的氮化钽 (TaN) 纳米结构涂层的表面表征和电化学性能

摘要 在本研究中,采用反应性直流磁控溅射法在 AISI 316 L 不锈钢基材上成功制备了 TaN 纳米结构涂层。在所有这些涂层工艺中,唯一的可变因素是溅射工艺中氮气分压 (PN2) 的百分比。为此,选择了 5%、10% 和 15% 的不同百分比的氮气分压百分比。涂层形成后,对其微观结构、化学成分和腐蚀行为进行了研究。通过扫描电子显微镜(SEM)研究涂层样品的微观结构,通过能量衍射光谱(EDS)、X射线衍射(XRD)和映射(MAP)分析对其元素和相组成进行分析。为了研究涂层的腐蚀行为,在模拟体液(林格溶液)中进行了电化学阻抗谱(EIS)和动电位极化(PDP)测试。样品在林格氏溶液中的浸泡时间分别为 1、24、48 小时和 7 天。不同试验的结果表明,含15%氮的涂层由硬质正交和六方氮化钽相组成,具有自由孔隙和更致密的微观结构。在所有浸泡时间内,该涂层都表现出比其他两种涂层更好的腐蚀行为。这种涂层的耐腐蚀性也随着浸泡时间从 1 小时增加到 7 天而增加。事实上,含15%氮气的涂层浸渍7天,电阻为118.68(MΩ.cm2),具有最高的耐腐蚀性。
更新日期:2020-12-01
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