Poly(phthalaldehyde) (pPHA) and copolymers with aliphatic aldehydes were investigated as dry-develop, positive-tone photoresist. Exposure of the films loaded with a photoacid generator to 248 nm radiation creates an acid that depolymerizes the polymer into volatile monomers, allowing the development of features by vaporization rather than solution-based processes. By controlling the acid content, the vaporization rate of the reaction products, and the degree of liquid formation of the decomposed polymer, control of spatial resolution and the quality of polyaldehyde dry-develop photoresist was achieved. Heat, vacuum, and forced convection were evaluated as development techniques in determining the resist sensitivity, contrast, and resolution. Forced convection of heated nitrogen was the most controllable development method for pPHA films. Five-micron lines and spaces were printed. Poly(aldehyde) copolymer resins had slightly lower spatial resolution but were able to be developed faster due to higher vapor pressure of the depolymerized monomers. Cold photo-exposures and development were used to prevent detrimental liquid formation of the decomposed copolymers. In addition to exploring new dry-development methods that have not been tested before, these findings offer insights into designing better material systems and optimizing processes for dry-develop photoresists.

研究了聚（邻苯二甲醛）（pPHA）和与脂肪族醛的共聚物作为干显影正性光刻胶。将装有光酸产生剂的薄膜暴露在248 nm辐射下会产生一种酸，该酸会将聚合物解聚成挥发性单体，从而允许通过汽化而不是基于溶液的工艺来形成特征。通过控制酸含量，反应产物的汽化速率以及分解的聚合物的液体形成程度，可以控制空间分辨率和多醛干显影光致抗蚀剂的质量。在确定抗蚀剂的灵敏度，对比度和分辨率时，将热，真空和强制对流作为显影技术进行了评估。加热氮气的强制对流是pPHA薄膜最可控的显影方法。印刷了五微米的线和空格。聚（醛​​）共聚物树脂的空间分辨率略低，但由于解聚单体的蒸气压较高，因此能够更快地显影。使用冷曝光和显影以防止分解的共聚物形成有害的液体。除了探索以前没有经过测试的新干显影方法外，这些发现还为设计更好的材料系统和优化干显影光致抗蚀剂的工艺提供了见识。