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Numerical Study of the Thresholds of Sputtering of Metals during Bombardment with Low-Energy Ions
Bulletin of the Russian Academy of Sciences: Physics Pub Date : 2020-07-16 , DOI: 10.3103/s1062873820060118
V. V. Evstifeev , N. V. Kostina

Abstract

The transfer of energy from bombarding \({{{\text{K}}}^{ + }}\) and \({\text{A}}{{{\text{r}}}^{ + }}\)ions ( = 10–100 eV) to vanadium atoms is studied via molecular dynamics using the Vs potential. The threshold energy of vanadium sputtering is determined, and a numerical way of determining the thresholds of sputtering for solids is proposed.


中文翻译:

低能离子轰击过程中金属溅射阈值的数值研究

摘要

轰击\({{{text {K}}} ^ {+}} \)\ {{text {A}} {{{\ text {r}}} ^ {+}}的能量转移\)离子(= 10-100伏特),以钒原子通过使用分子动力学研究V小号潜力。确定了钒溅射的阈值能量,提出了一种确定固体溅射阈值的数值方法。
更新日期:2020-07-16
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