当前位置: X-MOL 学术Microsc. Res. Tech. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Removal of hydrocarbon contamination and oxide films from atom probe specimens.
Microscopy Research and Technique ( IF 2.5 ) Pub Date : 2020-09-09 , DOI: 10.1002/jemt.23587
Michael Herbig 1 , Ankit Kumar 1
Affiliation  

Many materials science phenomena require joint structural and chemical characterization at the nanometer scale to be understood. This can be achieved by correlating electron microscopy (EM) and atom probe tomography (APT) subsequently on the same specimen. For this approach, specimen yield during APT is of particular importance, as significantly more instrument time per specimen is invested as compared to conventional APT measurements. However, electron microscopy causes hydrocarbon contamination on the surface of atom probe specimens. Also, oxide layers grow during specimen transport between instruments and storage. Both effects lower the chances for long and smooth runs in the ensuing APT experiment. This represents a crucial bottleneck of the method correlative EM/APT. Here, we present a simple and reliable method based on argon ion polishing that is able to remove hydrocarbon contamination and oxide layers, thereby significantly improving APT specimen yield, particularly after EM.

中文翻译:

去除原子探针样品中的碳氢化合物污染和氧化膜。

许多材料科学现象需要在纳米尺度上进行联合结构和化学表征才能理解。这可以通过随后在同一样本上关联电子显微镜(EM)和原子探针断层扫描(APT)来实现。对于这种方法,APT期间的样品产量尤为重要,因为与传统的APT测量相比,每个样品的仪器时间投入明显增加。但是,电子显微镜会导致原子探针样品表面的碳氢化合物污染。同样,在仪器之间和仪器之间的样品运输过程中,氧化层会生长。在随后的APT实验中,这两种效果均降低了长期平稳运行的机会。这代表了方法相关EM / APT的关键瓶颈。这里,
更新日期:2020-09-09
down
wechat
bug