A dual-wavelength photopolymerization process is presented, allowing for the volumetric fabrication of complex geometries using a multistep process. The methacrylate-based resin contained 0.1 wt % camphorquinone/0.1 wt % ethyl 4-(dimethylamino) benzoate and 0.2 wt % bis[2-(ochlorophenyl)-4,5-diphenylimidazole] as photoinitiator (473 nm) and photoinhibitor (365 nm), respectively. The photoinitiator and photoinhibitor concentrations were optimized to allow for photocuring to full depth (4.6 mm) following an exposure time of 2 min solely by 473 nm light, but no curing occurred when 365 nm light was present due to photoinhibition. This resin was validated using one-step volumetric fabrication of two objects containing voids defined by the 365 nm irradiation region. Two more complex structures were printed in a step-by-step manner, relying on the dynamic control of the projection patterns of both 365 and 473 nm projectors, decreasing the print time from 20 min using a commercially available single wavelength resin printer to 2 min.

中文翻译：

---

通过双波长聚合快速添加制造3D几何结构

提出了一种双波长光聚合工艺，允许使用多步工艺批量制造复杂的几何形状。甲基丙烯酸酯基树脂包含0.1 wt％樟脑醌/0.1 wt％4-（二甲基氨基）苯甲酸乙酯和0.2 wt％双[2-（邻氯苯基）-4,5-二苯基咪唑]作为光引发剂（473 nm）和光抑制剂（365 nm） ）， 分别。对光引发剂和光抑制剂的浓度进行了优化，以允许仅在473 nm的光下曝光2分钟后，光固化至全深度（4.6 mm），但是当由于光抑制而存在365 nm的光时，则不会发生固化。通过一步体积制造两个物体（包含由365 nm照射区域限定的空隙）来验证该树脂。逐步打印出两个更复杂的结构，