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Structure and properties of Ni1-xTixN thin films processed by reactive magnetron co-sputtering
Materials Characterization ( IF 4.7 ) Pub Date : 2020-11-01 , DOI: 10.1016/j.matchar.2020.110604
Bibhu Prasad Sahu , Monali Ray , Rahul Mitra

Abstract A comparative study has been carried out on microstructure evolution and residual stress along with nano-mechanical, nano-scratch, and corrosion behavior of thin films of Ni1-xTixN (x = 0.35, 0.42) nanocomposite and pure Ni deposited on mild steel substrates. The nanocomposite thin films were deposited in a reactive atmosphere having Ar:N2 = 1:2 by magnetron co-sputtering of high purity Ni (DC) and Ti (RF) targets. Rietveld analysis of grazing incidence X-ray diffraction (GIXRD) peaks has shown formation of 39 or 54 vol% TiN in the nanocomposite films deposited using RF target power of 250 or 300 W, respectively, at a constant DC power of 150 W. Further, with increase in Ti target power, the grain size of both matrix and TiN have decreased, as confirmed by analysis of GIXRD peak broadening and dark-field transmission electron microscopy. The biaxial residual stress measured using the Sin2Ψ technique has revealed that the stress is tensile in pure Ni thin film, whereas it becomes compressive in presence of TiN in Ni1-xTixN films. Furthermore, with increasing Ti target power, nanoindentation hardness, elastic modulus, and scratch-resistance are increased, whereas surface roughness and coefficient of friction are decreased. Potentiodynamic polarization experiments in 3.5 wt% NaCl solution has shown the pitting corrosion resistance to scale with TiN content due to formation of the TiO2-rich passivating layer, as confirmed by X-ray photoelectron spectroscopy. Further, the breakdown potential for passivation determined from Tafel plots scales with TiN content. The present study provides a novel method for altering the volume fraction of TiN and tailoring the microstructure of the investigated Ni1-xTixN nanocomposite films by varying the Ti (RF) target power to obtain a desirable combination of surface properties required in protective coatings, with fresh insight into the mechanisms governing structure-property relations.

中文翻译:

反应磁控共溅射制备Ni1-xTixN薄膜的结构与性能

摘要 对沉积在低碳钢基体上的 Ni1-xTixN (x = 0.35, 0.42) 纳米复合材料和纯 Ni 薄膜的微观结构演变和残余应力以及纳米力学、纳米划痕和腐蚀行为进行了比较研究。 . 通过磁控共溅射高纯度 Ni (DC) 和 Ti (RF) 靶材,在具有 Ar:N2 = 1:2 的反应性气氛中沉积纳米复合薄膜。掠入射 X 射线衍射 (GIXRD) 峰的 Rietveld 分析表明,在 150 W 的恒定直流功率下,分别使用 250 或 300 W 的射频靶功率沉积的纳米复合膜中形成了 39 或 54 vol% 的 TiN。 , GIXRD 峰展宽和暗场透射电子显微镜分析证实,随着 Ti 靶功率的增加,基体和 TiN 的晶粒尺寸均减小。使用 Sin2Ψ 技术测量的双轴残余应力表明,纯 Ni 薄膜中的应力是拉伸的,而 Ni1-xTixN 薄膜中存在 TiN 时则变为压缩。此外,随着 Ti 靶标功率的增加,纳米压痕硬度、弹性模量和抗划伤性增加,而表面粗糙度和摩擦系数降低。X 射线光电子能谱证实,由于形成富含 TiO2 的钝化层,在 3.5 wt% NaCl 溶液中的动电位极化实验表明,由于形成富含 TiN 的钝化层,其抗点蚀性能随 TiN 含量而变化。此外,从 Tafel 图中确定的钝化击穿电位与 TiN 含量成比例。
更新日期:2020-11-01
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