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Grayscale stencil lithography for patterning multispectral color filters
Optica ( IF 10.4 ) Pub Date : 2020-09-04 , DOI: 10.1364/optica.389425
Xinhao Li , Zheng Jie Tan , Nicholas X. Fang

Flat optics for spatially resolved amplitude and phase modulation usually rely on 2D patterning of layered structures with spatial thickness variation. For example, Fabry–Perot-type multilayer structures have been applied widely as spectral filter arrays. However, it is challenging to efficiently fabricate large-scale multilayer structures with spatially variable thicknesses. Conventional photo/eBeam-lithography-based approaches suffer from either low-efficiency and high-cost iterative processes or limitations on materials for spectral tunability. In this work, an efficient and cost-effective grayscale stencil lithography method is demonstrated to achieve material deposition with spatial thickness variation. The design of stencil shadow masks and deposition strategy offers arbitrarily 2D thickness patterning with low surface roughness. The method is applied to fabricate multispectral reflective filter arrays based on lossy Fabry–Perot-type optical stacks with dielectric layers of variable thickness, which generate a wide color spectrum with high customizability. Grayscale stencil lithography offers a feasible and efficient solution to overcome the thickness-step and material limitations in fabricating spatially thickness-varying structures. The principles of this method can find applications in micro-fabrication for optical sensing, imaging, and computing.

中文翻译:

用于图案化多光谱滤色镜的灰度模板光刻

用于空间分辨振幅和相位调制的平面光学器件通常依赖于具有空间厚度变化的分层结构的2D图案化。例如,法布里-珀罗型多层结构已广泛用作光谱滤光片阵列。然而,有效地制造具有空间可变厚度的大规模多层结构具有挑战性。传统的基于光电子束/光刻技术的方法要么效率低,成本高,迭代过程繁琐,要么由于材料的光谱可调性而受到限制。在这项工作中,证明了一种有效且具有成本效益的灰度模板光刻方法,可实现具有空间厚度变化的材料沉积。模板荫罩的设计和沉积策略可提供具有低表面粗糙度的任意2D厚度图案。该方法用于制造基于具有损耗的Fabry-Perot型光学叠层的多光谱反射滤光片阵列,该叠层具有可变厚度的介电层,从而产生具有高可定制性的宽光谱。灰度模板光刻技术提供了一种可行且有效的解决方案,以克服制造空间厚度变化结构时的厚度步长和材料限制。这种方法的原理可以在微制造中用于光学传感,成像和计算的应用。灰度模板光刻技术提供了一种可行且有效的解决方案,以克服制造空间厚度变化结构时的厚度步长和材料限制。这种方法的原理可以在微制造中用于光学传感,成像和计算的应用。灰度模板光刻技术提供了一种可行且有效的解决方案,以克服制造空间厚度变化结构时的厚度步长和材料限制。这种方法的原理可以在微制造中用于光学传感,成像和计算的应用。
更新日期:2020-09-20
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