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Photon Sieving: Selective and Sensitive Photon Sieve Based on III–V Semiconductor Nanowire Forest Fabricated by Lithography‐Free Process (Advanced Optical Materials 17/2020)
Advanced Optical Materials ( IF 9 ) Pub Date : 2020-09-04 , DOI: 10.1002/adom.202070070
Gil Ju Lee 1 , Kwangwook Park 2 , Min Seok Kim 1 , Sehui Chang 1 , Tae Joon Seok 1 , Hong‐Gyu Park 3 , Gunwu Ju 4 , Kyujung Kim 5 , Young Min Song 1
Affiliation  

In article number 2000198, Young Min Song and co‐workers report the theoretical and experimental demonstrations of a selective and sensitive photon sieve based on III–V semiconductor nanowire forests. The nanoscopic photonic phenomena of nanowire forests, which have been barely studied, are important for various applications such as physically unclonable functions and retinal prostheses. The cover image depicts the photon sieving effect by the implemented III–V nanowire‐based photon sieve.
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中文翻译:

光子筛分:通过无光刻工艺制造的基于III–V半导体纳米线森林的选择性和灵敏光子筛(先进光学材料17/2020)

Young Min Song及其同事在文章编号2000198中报告了基于III-V半导体纳米线森林的选择性和灵敏光子筛的理论和实验证明。尚未被研究的纳米线森林的纳米光子现象对于诸如物理上不可克隆的功能和视网膜假体的各种应用都是重要的。封面图像描绘了已实现的基于III–V纳米线的光子筛的光子筛分效果。
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更新日期:2020-09-05
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