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Hydrogen-modulated Ar/CH4 HWP-CVD for fast preparation of multi-wall carbon nanotube arrays with high specific capacitance
Diamond and Related Materials ( IF 4.1 ) Pub Date : 2020-11-01 , DOI: 10.1016/j.diamond.2020.108067
Peiyu Ji , Jiali Chen , Tianyuan Huang , Lanjian Zhuge , Xuemei Wu

Abstract Two-dimensional Multiwalled Carbon Nanotube arrays (MWCNTs) were prepared by a novel high-density helicon wave plasma chemical vapor deposition (HWP-CVD) at room temperature. Preliminary studies show that the MWCNTs prepared by this method has strong orientation and is perpendicular to the substrate surface, and exhibit a highly ordered array distribution. The addition of hydrogen can effectively improve the growth rate of MWCNTs and increase the aspect ratio. The height and aspect ratio of MWCNTs can be effectively increased with the increase of growth time. Electrochemical investigation indicated that MWCNTs have high specific capacitance (1.96 mF/cm−2) and excellent rate capability (81.6%).

中文翻译:

氢调制的 Ar/CH4 HWP-CVD 用于快速制备具有高比电容的多壁碳纳米管阵列

摘要 采用新型高密度螺旋波等离子体化学气相沉积(HWP-CVD)在室温下制备二维多壁碳纳米管阵列(MWCNTs)。初步研究表明,该方法制备的多壁碳纳米管具有很强的取向性,垂直于基板表面,呈现出高度有序的阵列分布。氢的加入可以有效提高多壁碳纳米管的生长速度,增加纵横比。MWCNTs的高度和纵横比可以随着生长时间的增加而有效增加。电化学研究表明,多壁碳纳米管具有高比电容(1.96 mF/cm-2)和优异的倍率性能(81.6%)。
更新日期:2020-11-01
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