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Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper
Thin Solid Films ( IF 2.1 ) Pub Date : 2020-10-01 , DOI: 10.1016/j.tsf.2020.138319
Ângela Elisa Crespi , Charles Ballage , Marie Christine Hugon , Jacques Robert , Daniel Lundin , Ian Vickridge , José Alvarez , Tiberiu Minea

Abstract Amorphous carbon-based coatings deposited on copper substrates by magnetron sputtering at different target-to-substrate distances were investigated. Films deposited at short distances as 2 cm presented the best results in terms of morphology, density, and resistivity. Ultraviolet near-infrared range spectrometry measurements determined total reflectance and ellipsometry, extinction coefficient, refraction index, and pseudo bandgap. Amorphous carbon films of 150 nm deposited at 2 cm reduced the total reflectance by up to 60 ± 5% in the near-infra-red range when compared to pure copper films. The addition of Fe* boosts the absorption of the coating reducing the total reflectance by up to 70 ± 5% in near-infrared. (Fe*: deposited from stainless-steel target used in direct-current magnetron sputtering). Also, Fe* reduces the electrical resistivity by a factor of 100 compared to that of pure amorphous carbon films. The reduction in total reflectance induced by the presence of the amorphous carbon-based films on copper depends, as expected, on light penetration depth and the absorption coefficient.

中文翻译:

低电阻率无定形碳基薄膜用作铜上的抗反射涂层

摘要 研究了通过磁控溅射在不同靶距衬底上沉积在铜衬底上的非晶碳基涂层。以 2 cm 的短距离沉积的薄膜在形态、密度和电阻率方面表现出最好的结果。紫外近红外范围光谱测量确定了总反射率和椭偏仪、消光系数、折射率和伪带隙。与纯铜膜相比,在 2 cm 处沉积的 150 nm 非晶碳膜在近红外范围内将总反射率降低了 60 ± 5%。Fe* 的添加增强了涂层的吸收,使近红外区域的总反射率降低了 70 ± 5%。(Fe*:由用于直流磁控溅射的不锈钢靶沉积而成)。还,与纯非晶碳薄膜相比,Fe* 将电阻率降低了 100 倍。正如预期的那样,由铜上无定形碳基薄膜的存在引起的总反射率的降低取决于光穿透深度和吸收系数。
更新日期:2020-10-01
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