Charge/light-related advancements have greatly pushed the development of modern technology, and the relationship between charge and light is worth exploring. While research into the applications of light and charge flow (photoelectric current) is in full swing, studies on the reaction between light and electrostatic charge have made little progress on rare ways to realize photo-stimulated discharge. Herein, we link electrostatic charge and light using a bridge of intense heat, which is produced from the efficient photothermal conversion of Ti₃C₂T_x MXene. The in situ photothermal conversion and selective thermally stimulated discharge are successfully combined, then novel light-induced electrostatic lithography can be realized on both polymethyl methacrylate glasses and nanofilms. In this process the surface temperature of Ti₃C₂T_x film can be as high as 300 °C using 808 nm near-infrared irradiation at a power density of 1.7 W cm⁻². The combination of light and electrostatic charge is also successfully applied to electrostatic printing and chemical reactions.

中文翻译：

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光诱导静电光刻：利用Ti3C2Tx MXene的光热转化对驻极体进行选择性放电

与电荷/光有关的进步极大地推动了现代技术的发展，电荷与光之间的关系值得探讨。尽管光和电荷流（光电电流）的应用研究如火如荼，但光与静电荷之间反应的研究在实现光刺激放电的罕见方法上却进展甚微。在这里，我们使用强热桥将静电荷和光联系起来，这是由Ti ₃ C ₂ T _x MXene的有效光热转化产生的。在原位将光热转换和选择性热激发放电成功地结合起来，然后可以在聚甲基丙烯酸甲酯玻璃和纳米膜上实现新型的光致静电光刻。在该过程中，使用功率密度为1.7 W cm ^-2的808 nm近红外辐射，Ti ₃ C ₂ T _x膜的表面温度可以高达300°C 。光和静电荷的结合也成功地应用于静电印刷和化学反应。