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Thin Metal Superlens Imaging in Nanolithography
International Journal of Optics ( IF 1.7 ) Pub Date : 2019-05-02 , DOI: 10.1155/2019/6513836
Jing Wang 1 , Yunlong Sheng 1
Affiliation  

Superlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two cavities. For the range of wavevector of interest, the typical high peak of transmission coefficient of superlens coincides with a local minimum of transmission coefficient of dielectric cavity. The peak of transfer function of system corresponds to the peak of transmission coefficient of dielectric cavity. Thin superlens imaging system in nanolithography is analyzed based on transfer function, which can be flattened by simply tuning transmission coefficient of dielectric cavity and superlens cavity. The results are further validated by Finite Element Method (FEM) simulations.

中文翻译:

纳米光刻中的薄金属超透镜成像

纳米光刻中的超透镜成像系统可以看作是两个FP腔的级联,即超透镜腔和超透镜之间的介电腔以及引入的高损耗掩模,并且通过考虑两个腔内部的多次反射来获得系统的传递函数。 。对于感兴趣的波矢范围,超透镜的典型透射系数高峰值与介质腔的透射系数的局部最小值一致。系统的传递函数的峰值对应于电介质腔的透射系数的峰值。基于传递函数分析了纳米光刻中的超透镜薄成像系统,可以通过简单地调节介电腔和超透镜腔的透射系数来使其平坦化。
更新日期:2019-05-02
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