In this paper, we report the influence of low-energy oxygen ion irradiation with fluence ranging from [Formula: see text][Formula: see text][Formula: see text] to [Formula: see text][Formula: see text][Formula: see text] on the structural, optical, and electrical properties of fresh and annealed (400∘C, 3[Formula: see text]h) zinc oxide (ZnO) thin films. These films were grown on soda-lime glass (SLG) substrates using the spin-coating method as a low-cost depositing technique. X-ray diffraction (XRD) study showed the formation of the hexagonal phase of ZnO thin films with preferred orientation along the (002) plane. The crystallite size for fresh and annealed ZnO thin films was in nanoscale and it increased with the annealing temperature. Also, the crystallite size increased with the ion beam irradiation fluence in the case of annealed ZnO films, while it slightly decreased for the fresh ZnO films. The transmittance and absorbance spectra for the ZnO films were investigated in a wide wavelength range. The optical bandgap was specified by using Tauc’s relation. The electrical properties of the ZnO films (fresh and annealed at 400∘C for 3[Formula: see text]h) were studied before and after the oxygen ion beam irradiation. Also, the dielectric properties were investigated with respect to frequency at different ion beam irradiation fluences. The comprehensive results showed the dielectric and optical properties are improved due to the induced conductive networks by oxygen ion irradiation.

中文翻译：

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低能氧离子束处理对氧化锌薄膜结构和物理性能的影响

在本文中，我们报告了低能氧离子辐照的影响，注量范围从[公式：见正文][公式：见正文][公式：见正文]到[公式：见正文][公式：见正文] 【公式：见正文】关于新鲜和退火（400∘C，3[公式：见正文]h）氧化锌（ZnO）薄膜。这些薄膜使用旋涂法作为低成本沉积技术在钠钙玻璃 (SLG) 基板上生长。X 射线衍射 (XRD) 研究表明形成了沿 (002) 平面具有择优取向的 ZnO 薄膜的六方相。新鲜和退火的 ZnO 薄膜的微晶尺寸为纳米级，并且随着退火温度的升高而增加。此外，在退火 ZnO 薄膜的情况下，微晶尺寸随着离子束辐照能量的增加而增加，而对于新鲜的 ZnO 薄膜，微晶尺寸略有下降。在宽波长范围内研究了 ZnO 薄膜的透射率和吸收光谱。通过使用 Tauc 关系指定光学带隙。ZnO 薄膜的电性能（新鲜并在 400 下退火）∘C对于3[公式：见正文]h)在氧离子束辐照前后进行了研究。此外，还研究了不同离子束辐照通量下的介电特性与频率的关系。综合结果表明，由于氧离子辐照诱导的导电网络，介电和光学性能得到改善。