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Residual Deformations and Mechanical Stresses in Macroporous and Nonporous Silicon Under Normal Etching Conditions
Journal of Electronic Materials ( IF 2.1 ) Pub Date : 2020-07-23 , DOI: 10.1007/s11664-020-08319-z
K. P. Konin , O. Yo. Gudymenko , V. P. Klad’ko , O. O. Lytvynenko , D. V. Morozovs’ka

Lattice changes of macroporous silicon were studied under variations in the etching conditions of macropores. It was established that under all the etching conditions, additional mechanical stresses and corresponding deformations arise up to the appearance of dislocations in the macroporous layer at elevated voltage or current.



中文翻译:

正常刻蚀条件下大孔和无孔硅中的残余变形和机械应力

在大孔刻蚀条件的变化下研究了大孔硅的晶格变化。已经确定,在所有蚀刻条件下,直到在升高的电压或电流下大孔层中出现位错,都会出现附加的机械应力和相应的变形。

更新日期:2020-08-14
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