Compared to conventional direct current (DC) and radio frequency (RF) magnetron sputtering, the pulsed radio frequency (PRF) magnetron sputtering circumvents the obstacle of a self-annealing temperature effect during the deposition, which may induce irregular crystallization or uneven chemical composition. The porous homogeneous amorphous WO₃ film prepared by the PRF magnetron sputtering shows large dual-band optical modulation in the visible and near infrared regions(93.6% in 633 nm and 90.6% in 1500 nm), short response time(3.2s for coloring and 5.6s for bleaching), decent coloration efficiency(56.8 cm²C⁻¹) and superior cycling stability(the optical modulation is dropped by 4.3% after 2000 cycles). In addition, the PRF WO₃ film also presents good energy-storage properties (44.0 mF/cm² areal capacitance), good capacitive cyclic stability without apparent capacitance loss after 2000 cycles and superior rate capability. The obtained bi-functional porous amorphous WO₃ film may find great potential in constructing high efficiency electrochromic energy storage and other intelligent nanodevices.

与常规的直流（DC）和射频（RF）磁控管溅射相比，脉冲射频（PRF）磁控管溅射避免了沉积过程中自退火温度效应的障碍，这可能会导致不规则结晶或化学成分不均匀。PRF磁控溅射制备的多孔均质非晶WO ₃膜在可见光和近红外区域显示出大的双波段光调制（633 nm为93.6％，1500 nm为90.6％），响应时间短（着色和固化时间为3.2s）。漂白时间为5.6s），良好的着色效率（56.8 cm ² C ^-1）和优异的循环稳定性（2000次循环后光调制下降4.3％）。此外，PRF WO ₃该薄膜还具有良好的储能性能（44.0 mF / cm ²面积电容），良好的电容循环稳定性，在2000次循环后无明显电容损耗，并且具有出色的倍率性能。所获得的双功能多孔非晶WO ₃膜可能在构建高效电致变色储能器和其他智能纳米器件中具有巨大潜力。