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Performance Enhancement of a ZnO-based UV Photodetector Using Patterned Ag Nanoparticles
Journal of the Korean Physical Society ( IF 0.6 ) Pub Date : 2020-08-01 , DOI: 10.3938/jkps.77.234
Seung Yun Lee , Gyujin Oh , Eun Kyu Kim

We studied the effect of a localized surface plasma resonance (LSPR) on ZnO-based ultraviolet photodetectors (UV-PDs) with periodic patterns of Ag nanoparticles (NPs), which had been formed by wrong a nanosphere lithography technique with a mask of polystyrene nanosphere arrays. The periodically patterned Ag NPs were positioned at the interface between the ZnO channel layer and the Si substrates, and the PD structures were constructed by forming two Al electrodes on the surface of the ZnO layer. Under λ = 365 nm UV light corresponding to the bandgap of ZnO, the photocurrent and the photoresponsivity of the ZnO UV-PDs with 100-nm-thick Ag NPs were about two times greater than those of PDs without NPs. The maximum responsivity was approximately 0.13 A/W near the 420- nm wavelength, which showed the maximum scattering efficiency. This enhanced performance of the ZnO-based UV-PDs resulting from an increase in the light absorption due to the LSPR of patterned Ag NPs.

中文翻译:

使用图案化银纳米粒子增强基于 ZnO 的紫外光电探测器的性能

我们研究了局部表面等离子体共振 (LSPR) 对具有周期性模式的 Ag 纳米粒子 (NP) 的 ZnO 基紫外光电探测器 (UV-PD) 的影响,这些模式是通过错误的纳米球光刻技术与聚苯乙烯纳米球掩膜形成的数组。周期性图案化的Ag NPs位于ZnO沟道层和Si衬底之间的界面处,通过​​在ZnO层表面形成两个Al电极来构建PD结构。在对应于 ZnO 带隙的 λ = 365 nm 紫外光下,具有 100 nm 厚 Ag NPs 的 ZnO UV-PDs 的光电流和光响应率大约是没有 NPs 的 PDs 的两倍。在 420 nm 波长附近的最大响应度约为 0.13 A/W,这表明散射效率最大。
更新日期:2020-08-01
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