Meniscus-guided coating methods, such as zone casting, dip coating and solution shearing, are scalable laboratory models for large-area solution coating of functional materials for thin-film electronics. Unfortunately, the general lack of understanding of how the coating parameters affect the dry-film morphology upholds trial-and-error experimentation and delays lab-to-fab translation. We present herein a model that predicts dry-film morphologies produced by meniscus-guided coating of a crystallizing solute. Our model reveals how the interplay between coating velocity and evaporation rate determines the crystalline domain size, shape anisotropy and regularity. If coating is fast, evaporation drives the system quickly past supersaturation, giving isotropic domain structures. If coating is slow, depletion due to crystallization stretches domains in the coating direction. The predicted morphologies have been experimentally confirmed by zone-casting experiments of the organic semiconductor 4-tolyl-bithiophenyl-diketopyrrolopyrrole. Although here we considered a small molecular solute, our model can be applied broadly to polymers and organic–inorganic hybrids such as perovskites.

弯月面引导的涂覆方法（例如区域浇铸，浸涂和溶液剪切）是可扩展的实验室模型，用于薄膜电子器件功能材料的大面积溶液涂覆。不幸的是，对涂层参数如何影响干膜形态的普遍缺乏理解支持了反复试验，并延误了从实验室到晶圆的翻译。我们在这里提出一种模型，该模型预测由结晶溶质的弯液面引导涂层产生的干膜形态。我们的模型揭示了涂层速度和蒸发速率之间的相互作用如何决定晶域尺寸，形状各向异性和规则性。如果涂覆速度很快，蒸发将使系统迅速过饱和，从而形成各向同性的畴结构。如果镀层很慢 由于结晶的耗尽，在涂覆方向上拉伸了畴。通过有机半导体4-甲苯基-联硫基苯基-二酮基吡咯并吡咯的区域浇铸实验已通过实验证实了所预测的形态。尽管这里我们考虑的是小分子溶质，但是我们的模型可以广泛地应用于聚合物和钙钛矿等有机-无机杂化体。