In this study, an improved alternating projection algorithm is presented for the pattern synthesis of a dual-polarised conformal array. An extra desired pattern is introduced to find an appropriate solution in the process of projecting the desired solution set to the feasible solution set. Virtual interferences are introduced to modify the solution iteratively based on the deviation between the obtained and desired pattern. Finally, the authors' algorithm is applied to dual-polarised conformal arrays and can achieve a suitable solution set between the predefined upper and lower bounds, which can synthesise both orthogonal polarisation components of the array pattern more effectively. Simulation examples are presented to verify the validity of the proposed algorithm.

中文翻译：

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改进的交替投影算法用于双极化共形阵列的图案合成

在 这项研究中，提出了一种改进的交替投影算法，用于双极化共形阵列的图案合成。在将所需解集投影到可行解集的过程中，引入了额外的所需模式以找到合适的解。引入虚拟干扰以基于所获得图案与期望图案之间的偏差来迭代地修改解决方案。最后，作者的算法应用于双极化共形阵列，并可以在预定义的上限和下限之间实现合适的解集，从而可以更有效地合成阵列图案的两个正交极化分量。仿真实例验证了所提算法的有效性。