A ternary Cr₂AlB₂ phase was deposited as a film using magnetron sputtering. Its anisotropic structure displays both structural and chemical similarities with the nanolaminated MAX phases (M_n+1AX_n (n = 1–3) where M usually is an early transition metal, A is typically an element in group 13–14 and X is C or N), and can be described as CrB slabs separated by layers of Al. Combinatorial sputtering was used to optimise the sputtering process parameters for films with the Cr₂AlB₂ composition. The influences of substrate, temperature and composition were studied using X-ray diffraction, X-ray photoelectron spectroscopy and electron microscopy. Films deposited at room temperature were X-ray amorphous but crystalline films could be deposited on MgO substrates at 680 °C using a composite Al-B, Cr and Al targets. X-ray diffraction analyses showed that the phase composition and texture of the films was strongly dependent on the chemical composition. Films with several phases or with a single Cr₂AlB₂ phase could be deposited, but an additional Al target was required to compensate for a loss of Al at the high deposition temperatures used in this study. The microstructure evolution during film growth was strongly dependent on composition, with a change in texture in Al-rich films from a preferred [⁰¹⁰] orientation to a [¹⁰⁰]/[⁰⁰¹] orientation. A model based on Al desorption from the surface of the growing grains is proposed to explain the texture variations.

中文翻译：

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纳米层状Cr2AlB2的磁控溅射

使用磁控溅射将三元Cr ₂ AlB ₂相沉积为膜。它的各向异性结构显示出与纳米层状MAX相（M _{n + 1} AX _n（n = 1-3）的结构和化学相似性，其中M通常是早期过渡金属，A通常是13-14组的元素，X是C或N），并且可以描述为由Al层分隔的CrB平板。组合溅射用于优化Cr ₂ AlB ₂薄膜的溅射工艺参数组成。利用X射线衍射，X射线光电子能谱和电子显微镜研究了基材，温度和组成的影响。在室温下沉积的薄膜是X射线非晶态的，但可以使用复合Al-B，Cr和Al靶在680°C的条件下将结晶膜沉积在MgO衬底上。X射线衍射分析表明，膜的相组成和织构强烈依赖于化学组成。具有多个相或具有单个Cr ₂ AlB _2的膜可以沉积相，但是需要额外的Al靶来补偿本研究中使用的高沉积温度下Al的损失。膜生长过程中的微观结构演变很大程度上取决于组成，富铝膜的织构从优选的[ ⁰¹⁰ ]方向变为[ ¹⁰⁰ ] / [ ⁰⁰¹ ]方向。提出了基于铝从生长晶粒表面脱附的模型来解释纹理变化。