Abstract

Nickel oxide (NiO) thin films were obtained by thermal oxidation of nickel layers coated on quartz. The influence of thermal oxidation temperatures on chemical and physical properties of prepared films was studied. X-ray results exhibited that all the films possess single cubic crystal structure phase of NiO along the (200) plane, and show good crystalline quality. The crystallinity of NiO films is increased with increase in oxidation temperature. Also, the structural parameters of the films were determined. The mean crystallite size was varied between 17 and 45 nm, which confirms the formation of nanocrystals in this study. Also, FTIR and EDS studies confirm the formation of NiO. According to SEM and AFM images, the grain size was influenced by augmentation in thermal oxidation temperature. The optical studies showed that with increase in thermal oxidation temperature, the transmittance increased, while the optical band gap decreased.

Graphic abstract

中文翻译：

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在不同热氧化温度下制备的纳米晶氧化镍薄膜的表征

摘要

氧化镍（NiO）薄膜是通过热氧化覆在石英上的镍层获得的。研究了热氧化温度对制备薄膜化学和物理性能的影响。X射线结果表明，所有薄膜均沿（200）平面具有NiO的单立方晶体结构相，并显示出良好的晶体质量。NiO薄膜的结晶度随氧化温度的升高而增加。而且，确定了膜的结构参数。平均晶粒尺寸在17至45 nm之间变化，这证实了这项研究中纳米晶体的形成。同样，FTIR和EDS研究证实了NiO的形成。根据SEM和AFM图像，晶粒尺寸受热氧化温度升高的影响。

图形摘要