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Plasma‐on‐Chip: device for non‐thermal atmospheric pressure plasma irradiation to single cells
Electronics and Communications in Japan ( IF 0.3 ) Pub Date : 2020-07-23 , DOI: 10.1002/ecj.12263
Shinya Kumagai 1 , Mime Kobayashi 2 , Tetsuji Shimizu 3 , Minoru Sasaki 4
Affiliation  

We report an improvement of the Plasma‐on‐Chip device that enables plasma irradiation to single cells. Dielectric barrier discharge structure was introduced and power consumption was reduced to 200 µW. The modification extended the operation time of the Plasma‐on‐Chip device. As long as 10 min plasma irradiation to yeast cells, Saccharomyces cerevisiae was conducted.

中文翻译:

片上等离子体:用于非热大气压等离子体照射单细胞的设备

我们报告了对等离子芯片设备的改进,该设备可以对单个细胞进行等离子辐射。引入了介电势垒放电结构,功耗降低至200 µW。该修改延长了等离子芯片设备的运行时间。只要对酵母细胞进行等离子辐射10分钟,就进行了酿酒酵母
更新日期:2020-07-23
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