Nanoscale multilayers can be used as highly localized heat sources, making them attractive for several applications, in particular for joining and as igniters. Over the last decades, academia and industry have given particular emphasis to nanoscale multilayers from the Ni–Al system. In this study, Al/Ni (V) multilayer thin films with periods of nominally 25 and 50 nm (bilayer thickness) and near equiatomic average stoichiometry were produced by d.c. magnetron sputtering from Al (99.999% pure) and Ni (93 wt % Ni, 7 wt % V) targets (vanadium was added to the Ni target to make it non-magnetic). Deposition parameters such as the substrate rotation speed and substrate bias were varied in order to evaluate their effect on the reactivity of the multilayers. The influence of in situ ion bombardment of the multilayer thin films was also studied. Phase identification was carried out by X-ray diffraction, while the microstructure was analyzed in detail by transmission electron microscopy, distinguishing alternating layers throughout the entire thickness of the films. Although the films mainly consist of Al- and Ni-rich layers, the presence of the Al₃Ni intermetallic phase was detected, except in the multilayers produced with the ion gun switched on during the deposition process. The ion bombardment, as well as the increase of the substrate bias, promote some microstructural disorder and thus affect the multilayers’ reactivity.

中文翻译：

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沉积参数对Al / Ni多层薄膜反应性的影响

纳米级多层可以用作高度局部化的热源，使其在多种应用中具有吸引力，特别是对于接合和点火器。在过去的几十年中，学术界和工业界特别重视Ni-Al系统中的纳米多层膜。在这项研究中，通过直流磁控溅射从Al（纯度为99.999％）和Ni（Ni含量为93 wt％，Ni）制备了标称周期为25和50 nm（双层厚度）且近似等原子平均化学计量的Al / Ni（V）多层薄膜，7 wt％的V）靶（将钒添加到Ni靶中使其变为非磁性）。改变诸如衬底旋转速度和衬底偏压的沉积参数，以便评估它们对多层反应性的影响。还研究了多层薄膜的原位离子轰击的影响。通过X射线衍射进行相鉴定，同时通过透射电子显微镜详细分析其微观结构，从而在整个薄膜厚度上区分出交替的层。尽管薄膜主要由富铝和富镍层组成，但铝的存在除在沉积过程中打开离子枪所产生的多层结构中，检测到₃ Ni金属间相。离子轰击以及底物偏压的增加促进了一些微结构失调，从而影响了多层的反应性。