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Fabrication and simulation of neutral-beam-etched silicon nanopillars
Vacuum ( IF 4 ) Pub Date : 2020-11-01 , DOI: 10.1016/j.vacuum.2020.109577
Min-Hui Chuang , Daisuke Ohori , Yiming Li , Kuan-Ru Chou , Seiji Samukawa

Abstract In this study, we do the experiment and simulation of the silicon nanopillars fabricated by a damage-free neutral-beam-etching system combined with bio-template-mask technology. The fabricated silicon nanopillars are with the diameter of 16 nm and the height of 90 nm and the density is 6.5 × 1010/cm2 with variation of 3%. We model and simulate the fabricated silicon nanopillars by periodical cylinder in Si0.7Ge0.3 matrix to estimate the energy profile with different wave vectors. The variations of the energy with respect to the height, diameter, and the separation of the simulated silicon nanopillars are reported. The results of this work will be useful for thermoelectric applications.

中文翻译:

中性束蚀刻硅纳米柱的制备与模拟

摘要 在本研究中,我们对通过无损中性束蚀刻系统结合生物模板掩模技术制备的硅纳米柱进行了实验和模拟。制备的硅纳米柱直径为 16 nm,高度为 90 nm,密度为 6.5 × 1010/cm2,变化为 3%。我们在 Si0.7Ge0.3 矩阵中通过周期性圆柱体对制造的硅纳米柱进行建模和模拟,以估计具有不同波矢量的能量分布。报告了能量随高度、直径和模拟硅纳米柱间距的变化。这项工作的结果将有助于热电应用。
更新日期:2020-11-01
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