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Microstructures of nickel-doped methylated silica membrane materials calcined in air: influence of Ni content
Ferroelectrics ( IF 0.8 ) Pub Date : 2020-07-03 , DOI: 10.1080/00150193.2020.1760596
Jing Yang 1 , Xiaoting Xing 1, 2 , Yamei Zhao 3 , Ruihua Mu 3 , Yani Guo 3 , Haiyun Hou 3
Affiliation  

Abstract Nickel-doped methylated silica membrane materials (Ni/CH3-SiO2) were prepared with tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) as silicon precursors, and Ni(NO3)2·6H2O as Ni source by sol-gel method. The effects of Ni content on the microstructures of Ni/CH3-SiO2 membrane materials were investigated by means of X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM) and N2 adsorption-desorption measurements. The results indicate that the Ni element is present in the form of Ni(NO3)2·6H2O in the gel material. After firing at 350 °C in air, the Ni element mainly exists in the form of Ni-O-Si skeleton and nano-crystalline NiO. As the Ni content increased, the dispersity of NiO particles reduced and the grain size increased gradually. The methyl group is present in the Si-CH3 form in the SiO2 network. After the loading of Ni, the total pore volume decreased while the average pore size increased. The prepared 0.1Ni/CH3-SiO2 membrane material exhibited excellent microporous structure and narrow pore size distribution with the average pore size of 1.94 nm. Its microporosity reached 79.9%, which increased by 17.9% compared with the CH3-SiO2 material without Ni-loading.

中文翻译:

在空气中煅烧的掺镍甲基化二氧化硅膜材料的微观结构:Ni含量的影响

摘要 以原硅酸四乙酯(TEOS)和甲基三乙氧基硅烷(MTES)为硅前驱体,Ni(NO3)2·6H2O为Ni源,采用溶胶-凝胶法制备了掺镍甲基化二氧化硅膜材料(Ni/CH3-SiO2)。通过X射线衍射(XRD)、傅里叶变换红外光谱(FTIR)、扫描电子显微镜(SEM)和N2吸附-解吸测量研究了Ni含量对Ni/CH3-SiO2膜材料微观结构的影响。结果表明Ni元素以Ni(NO3)2·6H2O的形式存在于凝胶材料中。在空气中 350 ℃下烧成后,Ni 元素主要以 Ni-O-Si 骨架和纳米晶 NiO 的形式存在。随着Ni含量的增加,NiO颗粒的分散性降低,晶粒尺寸逐渐增大。甲基以 Si-CH3 形式存在于 SiO2 网络中。加入Ni后,总孔容减小而平均孔径增大。制备的0.1Ni/CH3-SiO2膜材料具有优良的微孔结构和较窄的孔径分布,平均孔径为1.94 nm。其微孔率达到79.9%,比未加Ni的CH3-SiO2材料提高了17.9%。
更新日期:2020-07-03
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