Physical Vapor Deposition - Plasma Enhanced Chemical Vapor Deposition (PVD-PECVD) systems are used exclusively for deposition and doping of carbonaceous films. However, this technique presents promising characteristics for the deposition of silver nanoparticles (Ag-NPs) on textiles, which meet the industrial demand for a more versatile and efficient methodology than the Magnetron Sputtering (MS) technique. In this regard, cotton textiles were coated with Ag-NP films produced by PVD-PECVD, and compared in terms of technical Physical vapor deposition - plasma enhanced chemical vapor deposition (PVD-PECVD) system has been used exclusively for deposition and doping of carbonaceous films [silver nanoparticles (Ag-NPs)] on cotton fabrics and the findings are compared, in terms of technical efficiency and microbial inhibition, with those of the magnetron sputtering (MS) technique. It is found that the proposed technique presents promising characteristics for the deposition of silver nanoparticles (Ag-NPs) on textiles, which meet the industrial demand.efficiency and microbial inhibition, with findings in the literature for the MS technique.

物理气相沉积-等离子体增强化学气相沉积（PVD-PECVD）系统专门用于碳膜的沉积和掺杂。但是，该技术具有在纺织品上沉积银纳米颗粒（Ag-NPs）的令人鼓舞的特性，与磁控溅射（MS）技术相比，该技术可以满足工业上对更通用，更高效的方法的需求。在这方面，棉纺织品涂有PVD-PECVD生产的Ag-NP膜，并在技术上进行了比较。物理气相沉积-等离子增强化学气相沉积（PVD-PECVD）系统仅用于碳质的沉积和掺杂棉织物上的薄膜[银纳米颗粒（Ag-NPs）]，并就技术效率和微生物抑制方面对发现进行了比较，与磁控溅射（MS）技术相结合。结果发现，所提出的技术具有在工业上满足银纳米颗粒（Ag-NPs）在纺织物上沉积的前景，满足了工业需求，效率和微生物抑制的需求。