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Nanoscale Multi-Layer Thin Film Fabricated by Cathodic Arc Evaporation (CAE) Method
Journal of Superhard Materials ( IF 0.9 ) Pub Date : 2020-07-18 , DOI: 10.3103/s1063457620020057
Gholamreza Faghani , Sayed Mahmood Rabiee , Salman Nourouzi , Hassan Elmkhah

Abstract—

In the present study, TiN and CrN single-layer and TiN/CrN nanoscale multi-layer thin films have been deposited on 420C stainless steel (SS) substrate using a cathodic arc evaporation (CAE) method. The nanoindentation test showed that hardness of TiN/CrN nanoscale multi-layer thin film was 30 GPa that is harder than TiN (HTiN = 23 GPa) and CrN (HCrN = 19 GPa). Ball-on-disk tribometer and Rockwell-C indentation methods showed respectively better sliding wear performance for TiN/CrN nanoscale multi-layer coating and better adhesion strength for CrN single-layer coating in comparison to all samples. Finally it was found that the TiN/CrN nanoscale multi-layer thin film can be used for tribological applications on 420C SS where high hardness and wear resistance and low friction coefficients are essential.


中文翻译:

阴极电弧蒸发(CAE)法制备纳米级多层薄膜

摘要-

在本研究中,TiN和CrN单层和TiN / CrN纳米级多层薄膜已通过阴极电弧蒸发(CAE)方法沉积在420C不锈钢(SS)衬底上。纳米压痕测试表明,TiN / CrN纳米多层薄膜的硬度为30 GPa,比TiN(H TiN = 23 GPa)和CrN(H CrN)硬。= 19 GPa)。与所有样品相比,圆盘球式摩擦计和Rockwell-C压痕方法分别显示了TiN / CrN纳米多层涂层的更好的滑动磨损性能和CrN单层涂层的更好的粘附强度。最终发现,TiN / CrN纳米级多层薄膜可用于420C SS上的摩擦学应用,在这些应用中,高硬度和耐磨性以及低摩擦系数是必不可少的。
更新日期:2020-07-18
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