Multilayer structure came into focus as a potential material in nuclear environment due to the special interface effect. Here, we studied the stability and chemical evolution of sputtered Zr/Si multilayer during annealing at 600 °C and 800 °C in air to explore its potential application as protective coating for nuclear materials. At 600 °C after 20 h oxidation, only the top Zr layer was oxidized and the diffusion of Si into the buried Zr layers contributed to the formation of Zr₃Si compound layer uniformly. At 800 °C, the first Zr layer and Si layer were oxidized into m-ZrO₂ and amorphous SiO₂ layer, respectively. Underneath these oxide capping layers, the ZrSi compound layers near surface transformed into Zr-rich silicate layers with prolonged oxidation time. The continuous incorporation of Si into silicate layer triggered a reduction reaction to form Si-rich ZrSi₂. Then, some silicon particles were formed through the de-alloying process of ZrSi₂ and kept coherent interface with ZrSi₂. These compounds were in situ formed in the original layer position, which maintained the multi-interface character. With further oxidation, this ZrSi₂&Si layer was finally oxidized with self-healing ability.

由于特殊的界面效应，多层结构作为核环境中的潜在材料受到关注。在这里，我们研究了溅射的Zr / Si多层膜在600°C和800°C的空气中退火过程中的稳定性和化学演化，以探索其在核材料保护涂层中的潜在应用。氧化20小时后，在600°C，仅顶层Zr层被氧化，并且Si扩散到掩埋Zr层中，这有助于均匀地形成Zr ₃ Si化合物层。在800℃下，第一Zr层和Si层分别被氧化为m -ZrO ₂和非晶SiO ₂层。在这些氧化物覆盖层的下方，Zr表面附近的Si化合物层随着氧化时间的延长转变为富含Zr的硅酸盐层。将Si连续掺入硅酸盐层中引发还原反应以形成富含Si的ZrSi ₂。然后，通过ZrSi ₂的脱合金工艺形成一些硅颗粒，并保持与ZrSi _2的相干界面。这些化合物在原始层位置原位形成，从而保持了多界面特性。通过进一步氧化，该ZrSi ₂＆Si层最终被氧化，具有自修复能力。